Nxp B.v.

Nexperia B.v.

Phil Rutter

Steven Thomas Peake

Adam Richard Brown

Barry Wynne

Yan Lai

Saurabh Pandey

Mark Gajda

Jim Brett Parkin

Ian Culshaw

Steven Waterhouse

Chris Rogers

The present disclosure relates to a semiconductor device, and associated method of manufacture. The semiconductor device includes, MOSFET integrated with a p-n junction, the p-n junction arranged as a clamping diode across a source contact and a drain contact of the MOSFET. The MOSFET defines a first breakdown voltage and the clamping diode defines a second breakdown voltage, with the first breakdown voltage being greater than the second breakdown voltage so that the clamp diode is configured and arranged to receive a low avalanche current and the MOSFET is configured and arranged to receive a high avalanche current.

Semiconductor device with integrated clamp diode

A field effect transistor semiconductor device having a compact device footprint for use in automotive and hot swap applications. The device includes a plurality of field effect transistor cells with the plurality of transistor cells having at least one low threshold voltage transistor cell and at least one high threshold voltage transistor cell arranged on a substrate. The field effect transistor semiconductor device is configured and arranged to operate the at least one high threshold voltage transistor cell during linear mode operation, and operate both the low threshold voltage transistor cell and the high threshold voltage transistor cell during resistive mode operation. Further provided is a method of operating field effect transistor semiconductor device including a plurality of field effect transistor cells that includes at least one low threshold voltage transistor cell and at least one high threshold voltage transistor cell.

Semiconductor device and method of operation for low and high threshold voltage transistors

A semiconductor uses an isolation trench, and one or more additional trenches to those required for isolation are provided. These additional trenches can be connected between a transistor gate and the drain to provide additional gate-drain capacitance, or else they can be used to form series impedance coupled to the transistor gate. These measures can be used separately or in combination to reduce the switching speed and thereby reduce current spikes.

Semiconductor device having isolation trenches

A trench-gate device with lateral RESURF pillars has an additional implant beneath the gate trench. The additional implant reduces the effective width of the semiconductor drift region between the RESURF pillars, and this provides additional gate shielding which improves the electrical characteristics of the device.

Trench-gate RESURF semiconductor device and manufacturing method

A trench-gate semiconductor device is disclosed, in which the player () which forms the body region (in a n-channel device) extends adjacent the trench () deeper into the device, to lie adjacent a lower trench electrode (). Since the p-layer extension () forms part of the channel, it must be very low doped, in order not to increase unduly the channel resistance in the on-state. The replacement of some of the out-diffusion resistance in the drift region by the (smaller) channel resistance results in a lower over-all Rdson. In the off-state, the p-layer forms, together with the underlying n-drift layer, a non-abrupt function, so that the depletion region in the off-state extends closer to the top surface () than for a conventional RSO trench-MOS, being split between the p- and n-layers, rather than all being in the n-drift region. The invention does not require a RESURF device structure, so has wide process windows, since the dopant levels and layer thicknesses do not have to be controlled to provide charge balancing.

Trench-gate semiconductor device

Consistent with an example embodiment, there is a package that includes a first voltage terminal, and a second voltage terminal, a first die including a first MOSFET having a drain region electrically connected to the first voltage terminal and further having a source region, A second die is adjacent to the first die, the second die includes a second MOSFET having a drain region electrically connected to the source region of the first MOSFET and having a source region electrically connected to the second voltage terminal. The semiconductor package further includes a vertical capacitor having a first plate electrically connected to the drain region of the first MOSFET and a second plate electrically connected to the source region of the second MOSFET and the second plate is electrically insulated from the first plate by a dielectric material. The capacitor is integrated on the first die or the second die.

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Stockport, United Kingdom

Phil Rutter