Asml Netherlands B.v.

Petrus Martinus Gerardus Johannes Arts

Erik Henricus Egidius Catharina Eummelen

Giovanni Luca Gattobigio

Ferdy Migchelbrink

Gheorghe Tanasa

Miao Yu

Arnoldus Johannes Martinus Jozeph Ras

Jimmy Matheus Wilhelmus Van De Winkel

Daan Daniel Johannes Antonius Van Sommeren

Jeroen Arnoldus Leonardus Johannes Raaymakers

Harold Sebastiaan Buddenberg

Floor Lodewijk Keukens

Marijn Wouters

Seerwan Saeed

Nicolaas Ten Kate

Raymond Wilhelmus Louis Lafarre

Theodorus Wilhelmus Polet

Laurentius Johannes Adrianus Van Bokhoven

Han Henricus Aldegonda Lempens

Henricus Jozef Castelijns

Maarten Holtrust

A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

Cleaning device and method of cleaning

An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Inspection substrate and an inspection method

In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.

Immersion lithographic apparatus and device manufacturing method

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Petrus Martinus Gerardus Johannes Arts