Philips Electronics North America Corporation

Philips Electronics N.a. Corporation

Petrus J Prinsen

Edwin A Montie

William N Osborne

Edward C Cosman

A method for providing a resistive focusing lens structure for an electron beam device including forming a suspension of particles of a mixture of, by weight, of about 33-50% of an oxidic conductive material including about 40-60% of a lead ruthenate, about 25-38% of a lead titanate and about 2-15% of a ruthenium oxide, and of about 50-67% of a glass including about 30-40% of silicon dioxide (SiO.sub.2), about 3-7.5% alumina (Al.sub.2 O.sub.3), and about 53-67% of lead oxide (PbO) in a suspending medium consisting essentially of a non-acidic liquid having a boiling point of less than 150.degree. C., applying the suspension to an inside surface of a glass member to thereby provide a coating of the particles on the inside surface, firing the coating at a temperature of 700-900.degree. C. and before of after firing the coating, patterning the coating. The present method provides highly reproducible resistive focusing lens structures.

Method for providing a resistive lens structure for an electron beam

A focussing lens for an electron beam device is formed by a helically coiled resistance layer of a fired suspension of a conductive material of a mixture of a lead rathenate, a lead titanate and a ruthenium oxide in a glass formed of silicon dioxide, aluminum oxide and lead oxide.

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Eindhoven, Netherlands

Petrus J Prinsen