United Microelectronics Corp.

Peter Y Lin

Water Lur

Eric Chu

Chang-Shyan Kao

An apparatus for loading wafers into horizontal quartz tube, the apparatus includes a base plate, holding plate, trolley main body and two supporting bases. The base plate has a plurality of stages, which is lifted by a loading rod and fixed atop thereon, for placing wafers. The holding plate has a plurality of fixing screws and altitude adjusting screws for supporting the base plate and changing an altitude of the base plate to match an altitude of wafer boat. The trolley main body, which supports the holding plate by supporting pillars, provides with a plurality of position holes for carrying the holding plate and moving the base plte. The two supporting bases are connected by a solid plate, whose both ends are respectively attached at hollows formed at the middle of each of the two supporting bases. The two supporting bases are provided with a pair of slide bearings on either side of the solid plate. The slide bearings are fitted with two parallel silde shafts out of the horizontal quartz tube, thereby allowing the two supporting bases to travel along the slide shaft into and out of the horizontal quartz tube. In addition, the supporting bases have several pins adapted to mate with the position holes of the trolley main body to mount the trolley main body on the solid plate, thereby allowing the wafer boat to move along with the two supporting bases.

Apparatus for loading wafers into a horizontal quartz tube

The present invention relates to an improved equipment in semiconductor processing. The invention includes a horizontal quartz tube surrounded with heating element for processing wafers, an inlet pipe of a gas injector mounted at the center of the closed end of a horizontal quartz tube, four sheath supports each being 90 degrees apart located at the closed end of a horizontal quartz tube for supporting a thermocouple sheath. The horizontal quartz tube is rotated 90 degrees every 14 to 15 days in a predetermined direction. As the horizontal quartz tube is rotated, the thermocouple sheath is always inserted into the sheath support located at the bottom of the horizontal quartz tube.

Method and apparatus for preventing distortion of horizontal quartz tube

In accordance with the invention a rough overlayer, e.g., a tungsten film, is used to define a plurality of pillars in a polysilicon electrode layer. This increases the surface area of the polysilicon electrode and thus increases capacitance of a capacitor incorporating the electrode layer in a DRAM cell.

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Gong Goan Shiang, Taiwan

Peter Y Lin