Ims Ionen Mikrofabrikations Systeme Gesellschaft M.b.h.

Ims Ionen Mikrofabrikations Systeme Gesellschaft

Peter Wolf

Gerhard Stengl

Hans Loschner

Alfred Chalupka

Gertraud Lammer

Johannes Fegerl

In addition to the three electrodes of a unipotential lens following a plasma chamber, an ion source for ion beam lithography or ion beam semiconductor or the like has a fourth electrode which is at the same potential as the second electrode and at a potential lower than the potential of the first and third electrodes The result is improved resolution.

Ion source

A multipole corrective element with the individual poles being electromagnetically energized individually and selectively to create a variable field around a charged particle beam projected through a mask and a lens system onto a substrate, e.g. an ion-beam or electron-beam microlithography. The corrective element is provided independently of the ion-optical lens system between the latter and the mask, preferably proximal to the mask.

Ion-projection apparatus and method of operating same

Growing community of inventors

Vienna, Austria

Peter Wolf