Ametek, Inc.

Peter V Meyers

Mitchell E Doty

Jacob F Betz

Chung-Heng Liu

Timothy J Frey

Gabor F Fulop

A heterojunction p-i-n photovoltaic cell having at least three different semiconductor layers formed of at least four different elements comprises a p-type relatively wide band gap semiconductor layer, a high resistivity intrinsic semiconductor layer, used as an absorber of light radiation, and an n-type relatively wide band gap semiconductor layer. The intrinsic layer is in electrically conductive contact on one side with the p-type layer and on an opposite side with the n-type layer. First and second ohmic contacts are in electrically conductive contact with the p-type layer and the n-type layer, respectively.

Method of making heterojunction P-I-N photovoltaic cell

A method of making a multi-layer photovoltaic cell containing a heat-treated layer including Cd and Te, comprising the sequential steps of applying a chloride to the layer, heat-treating the layer with the chloride thereon, and subsequently depositing another semiconductor layer thereon.

Method of making photovoltaic cell with chloride dip

Heterojunction p-i-n photovoltaic cell

Photovoltaic cell comprises thin film cadmium telluride in ohmic contact with a conductive substrate, preferbaly comprising a cadmium surface, through a cadmium-rich layer at the interface with the substrate. The cell further includes a rectifying barrier layer which may be a Schottky barrier. The film is electrodeposited on the substrate surface and the substrate materials and electrodeposition conditions are controlled so as to produce a substantially stoichiometric deposit. Preferably, the film or cell is subsequently treated to enhance its efficiency.

Cadmium telluride photovoltaic cells

Photovoltaic cell comprises thin film cadmium telluride in ohmic contact with a smooth conductive substrate, preferably comprising a cadmium surface, through a cadmium-rich layer at the interface with the substrate, the cell further including a rectifying barrier layer. Preferably, the film is electrodeposited on the substrate surface with specific materials and process conditions. Preferably also, the film or cell is subsequently treated to enhance its barrier layer interface function.

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Green Lane, PA, United States of America

Peter V Meyers