Leica Biosystems Melbourne Pty Limited

Peter Toogood

Stephen John Bagnato

Mark Dockrill

Kenneth Heng-Chong Ng

Martin Limon

Anthony Favaloro

Mark Wilcock

Daniel Dobrogorsky

Greg Boyes

Ashan Chiranga Perera

Brendyn Murray Rodgers

Gregory William Boyes

Kenneth Heng-Chong

Kenneth He-cho Ng

Brendyn Rodgers

Mark Brian Dockrill

A thermal system for controllably altering a temperature within a reaction chamber in a sample processing assembly is described. The reaction chamber is bounded by a substrate and cover member in the sample processing assembly. The thermal system includes at least one thermal generator for generating temperature changes, one or more transfer layers for transferring temperature changes between the thermal generator and the sample on the substrate and a fluid isolator for isolating the thermal generator from fluid dispensed into the reaction chamber.

Thermal module for a sample processing assembly

A cover member for a substrate supporting a biological sample comprises first and second opposing ends, first and second opposing surfaces, a void in the second surface which, when juxtaposed with a substrate, forms a chamber, and a fluid inlet toward the first end and in fluid communication with the void. The void is bounded by void walls having one or more contoured regions for enhancing fluid movement within the chamber. A treatment module for a biological sample comprises the cover member, a support surface for a substrate bearing the biological sample and clamp means operable to releasably retain the cover member in juxtaposition with the substrate for an incubation period. A method for incubating the biological sample with one or more reagents uses the cover member.

Cover member, method and treatment module for treating a biological sample on a substrate

A sample processing assembly for treatment of a sample on a substrate includes a mounting surface for the substrate and a closure body configured to releasably retain a cover member. The closure body is movable between an open position and a substantially closed position. When a substrate is placed in the assembly and the closure body is in the substantially closed position while retaining a cover member, a reaction chamber is formed for processing a sample. A cover member for use with the sample processing assembly is also provided.

Slide staining assembly and cover member

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Vermont, Australia

Peter Toogood