Asml Netherlands B.v.

Peter Smits

Jeroen Johannes Sophia Maria Mertens

Sjoerd Nicolaas Lambertus Donders

Sebastiaan Maria Johannes Cornelissen

Patrick Johannes Cornelus Hendrik Smulders

Christiaan Alexander Hoogendam

Bob Streefkerk

Martinus Hendrikus Antonius Leenders

Hans Jansen

Michel Riepen

Jan-Gerard Cornelis Van Der Toorn

Roelof Frederik De Graaf

Franciscus Johannes Joseph Janssen

Hernes Jacobs

Pieter Renaat Maria Hennus

Joost Jeroen Ottens

Erik Roelof Loopstra

Andre Bernardus Jeunink

Frits Van Der Meulen

Martijn Houben

Marcus Martinus Petrus Adrianus Vermeulen

Rene Theodorus Petrus Compen

Martinus Agnes Willem Cuijpers

Peter Paul Steijaert

Hendrikus Johannes Marinus Van Abeelen

Hubert Matthieu Richard Steijns

Johannes Antonius Maria Van De Wal

Cornelis Christiaan Ottens

Antonius Arnoldus Meulendijks

Patrick Johannes Cornelus Hendrick Smulders

Jeroen Johannes Sophia Mara Mertens

A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.

Lithographic apparatus and device manufacturing method

In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed and in an embodiment, reduces transmission of forces between the different parts.

Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.

Substrate support and lithographic process

A lithographic apparatus is disclosed in which a circular sensor is mounted to a substrate table with three leaf springs that are evenly spaced around a thermal axis of the sensor. The leaf springs are provided in two parts that are releasably attachable to each other. The leaf springs are elastic and allow some movement of the sensor relative to the substrate table on thermal expansion and contraction but ensure that the thermal center of the sensor does not move relative to the substrate table.

Lithographic apparatus with mounted sensor

In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate displacement mechanism using, for example, a combination of one or more leaf springs and one or more electromagnets or a combination of one or more linear actuators and one more pins, is used to moving the closing plate toward or from the liquid confinement structure. In an embodiment, an adjustment plate is used to compensate for closing plates of varying thickness in closing plate receptacles of varying depth on different substrate tables.

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Baarlo, Netherlands

Peter Smits