Asml Netherlands B.v.

Peter Simon Antonius Knapen

Johan Hendrik Klootwijk

Pieter-Jan Van Zwol

Arnoud Willem Notenboom

Adrianus Johannes Maria Giesbers

Evgenia Kurganova

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Aleksandar Nikolov Zdravkov

Hendrikus Jan Wondergem

Johannes Petrus Martinus Bernardus Vermeulen

Paul Janssen

Antonius Franciscus Johannes De Groot

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Hrishikesh Patel

Gerrit Van Den Bosch

Chaitanya Krishna Ande

Johannes Joseph Janssen

Marcel Peter Meijer

Wouter Rogier Meijerink

Raymond Olsman

Marcus Adrianus Van De Kerkhof

Johannes Christiaan Leonardus Franken

Dennis De Graaf

Alexey Sergeevich Kuznetsov

Ties Wouter Van Der Woord

Mahdiar Valefi

Alexander Ludwig Klein

Sander Baltussen

Alexandar Nikolov Zdravkov

Maria Peter

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

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Deurne, Netherlands

Peter Simon Antonius Knapen