Asml Netherlands B.v.

Carl-zeiss-smt Ag

Peter Schaap

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Marcel Beckers

Bernhard Geuppert

Franz Sorg

Leon Martin Levasier

Adrianus Hendrik Koevoets

Bernardus Antonius Johannes Luttikhuis

Siegfried Alexander Tromp

Marcel Koenraad Marie Baggen

Jan Jaap Kuit

Dirk-Jan Bijvoet

Jan Frederik Hoogkamp

Laurentius Catrinus Jorritsma

Christianus Wilhelmus Johannes Berendsen

Adrianus Franciscus Petrus Engelen

Johannes Wilhelmus De Klerk

Peter Deufel

Henricus Jozef Castelijns

Jan-Jaap Kuit

Aart Adrianus Van Beuzekom

Hubertus Antonius Geraets

Albert Johannes Maria Jansen

Maria Johanna Agnes Rubingh

Johannes Martinus Andreas Hazenberg

Arjan Martin Van Der Wel

Petrus Franciscus Wilhelmus Maria Mandigers

Joep Janssen

Hubrecht Bastiaan Jasperse

A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation

A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

Lithographic apparatus, device manufacturing method and exchangeable optical element

A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.

Stage apparatus, lithographic apparatus and device manufacturing method

A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.

Lithographic apparatus, device manufacturing method and device manufactured thereby

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Eindhoven, Netherlands

Peter Schaap