Veeco Instruments Inc.

Vebco Instruments Inc.

Peter Porshnev

Boris L Druz

Rustam Yevtukhov

Alan V Hayes

Robert G Hieronymi

Rhodri Elliott

Mathew Levoso

James M Best, Jr

The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.

Ion sources and methods for generating ion beams with controllable ion current density distributions over large treatment areas

Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems that reduces grid damage during operation. In various embodiments, the ion source is coupled to a process chamber and a grid short clearing system includes methods for supplying a gas to the process chamber and setting the gas pressure to a predetermined gas pressure in the range between 50 to 750 Torr, applying an electrical potential difference between each adjacent pair of grids using a current-limited power supply, and detecting whether or not the grid shorts are cleared. The electrical potential difference between the grids is at least 10% lower than the DC electrical breakdown voltage between the grids with no contaminants.

Ion beam materials processing system with grid short clearing system for gridded ion beam source

Growing community of inventors

Northport, NY, United States of America

Peter Porshnev