Plansee Composite Materials Gmbh

Oerlikon Surface Solutions Ag, Pfaffikon

Plansee Se

Ceratizit Austria Gesellschaft M.b.h.

Plansee Aktiengesellschaft

Oerlikon Surface Solutions Ag, Pfaeffikon

Oerlikon Surface Solutions Ag, Trubbach

Peter Polcik

Mirjam Arndt

Martin Kathrein

Paul Heinz Mayrhofer

Sabine Woerle

Szilard Kolozsvari

Gerhard Dipl-Ing Leichtfried

Karl Huber

Christian Weratschnig

Harald Lackner

Helmut Riedl

Peter Abenthung

Siegfried Krassnitzer

Jürgen Ramm

Beno Widrig

Juergen Ramm

Juerg Hagmann

Hamid Bolvardi

Malko Gindrat

Richard Rachbauer

Christoph Czettl

Oliver Hunold

Christian Martin Koller

Peter Wilhartitz

Stefan Schönauer

Jiri Kalas

Enrico Franzke

Rudolf Gradinger

Hans-Georg Oemer

Helmut Riedl-tragenreif

Thomas Glechner

Paul Mayrhofer

Marcus Wolff

Johanna Rosen

Joerg Paulitsch

Annika Vieweg

Stefan Schlichtherle

Ulrich Miller

Claude Michotte

Markus Pohler

Vincent Moraes

Igor Zhirkov

Conrad Polzer

Conrad Wilhelm Polzer

Ronnie Innerwinkler

Sabine WÖRLE

Mirijam Arndt

Corinna Sabitzer

Matthias Perl

Johanna Rosén

A coated article includes a coated surface which consists of a substrate and a coating system. The coating system has at least one protective layer consisting of one or more transition metal borides and one dopant element, wherein: 13 the protective layer having chemical element composition defined by the formula TMBSi, where TM is one or more of the transition metal elements Chromium and Hafnium; Si is Silicon present in the protective layer as the dopant element; B is Boron; x is the concentration in atomic percent of TM; y is the concentration in atomic percent of B; and q is the concentration in atomic percent of Si, where x+y+q=1, 0.15≤x≤0.33, 0.40≤y≤0.67, and 0.1≤q≤0.40, and—the atomic concentration ratio of boron to the transition metals in the protective layer is higher or equal to 2, i.e. y/x≥2, and—the protective layer exhibits an AlBcrystal structure.

Coated article with enhanced oxidation resistance properties

A superalloy target wherein the superalloy target has a polycrystalline structure of random grain orientation, the average grain size in the structure is smaller than 20 μm, and the porosity in the structure is smaller than 10%. Furthermore, the invention includes a method of producing a superalloy target by powder metallurgical production, wherein the powder-metallurgical production starts from alloyed powder(s) of a superalloy and includes the step of spark plasma sintering (SPS) of the alloyed powder(s).

Superalloy target

A superalloy workpiece includes a superalloy substrate and an interface layer (IF-1) of essentially the same superalloy composition directly on a surface of the superalloy substrate. A transition layer (TL) of essentially the same superalloy and superalloy oxides or a different metal composition and different metal oxides is on the interface layer (IF-1). The oxygen content of the transition layer increases from the interface layer (IF-1) towards a barrier layer (IF-2) of super alloy oxides or of different metal oxides.

PVD bond coat

A target for use in a physical vapor deposition process includes a matrix composed of a composite material selected from the group consisting of aluminum-based material, titanium-based material and chromium-based material and all combinations thereof. The matrix is doped with doping elements and the doping elements are embedded as constituents of ceramic compounds or aluminum alloys in the matrix. The doping elements are selected from the group of the lanthanides: La, Ce, Nb, Sm and Eu. A process for producing such a target and a use of such a target in a physical vapor deposition process are also provided.

Sputter target and method for producing a sputter target

A vacuum arc source for arc evaporation of boride includes: a cathode made of at least 90 at-% of boride, in particular made of more than 98 at-% of boride; an anode, which is preferably in the shape of a disk; a body made of a material which is less preferred by arc discharge compared to the cathode, the body surrounding the cathode in such a way that during operation of the vacuum arc source, movement of an arc on an arc surface of the cathode is limited by the body. At least 90 at-% of the material of the anode is of the same chemical composition as the cathode.

Vacuum arc source

The present invention relates to coatings comprising or consisting of one or more ternary TM-diboride coating films. The ternary TM-diboride coating films showing exceptionally high phase stability and mechanical properties, even at high temperatures or even after exposition to high temperatures.

Ternary TM-diboride coating films

A target includes a target plate and a stabilizing layer which is joined to the rear side of the target plate. The stabilizing layer was produced by high-kinetic-energy spraying of stabilizing material onto the target plate. A process for producing a target is also provided.

Target and process for producing a target

The present invention relates to a conductive target material comprising essentially one lithium compound, preferably lithium phosphate, and carbon, and also typical impurities. The invention further relates to a process for producing a conductive target material and to the use thereof.

Conductive target material

A process for producing a hard material layer on a substrate. A multilayer coating system is applied to the substrate by alternate deposition of CrTaN and AlTiN by way of physical vapor deposition (PVD). The CrTaN and/or the AlTiN are preferably deposited from a composite target.

Method for producing a hard material layer on a substrate, hard material layer, machining tool and coating source

A process for producing a coating source for physical vapour deposition provides the coating source with a target layer formed of an at least two-phase composite which contains a metallic phase and at least one further phase and a mechanical stabilizing layer which is joined to the target layer on one side of the target layer. A first powder mixture which corresponds in terms of its composition to the at least two-phase composite and a second powder mixture which corresponds in terms of its composition to the mechanical stabilizing layer are densified hot in superposed layers. A coating source for physical vapour deposition is also provided.

Coating source

A coating source for physical vapor deposition to produce doped carbon layers. The coating source is produced by way of sintering from pulverulent components and is formed of carbon as matrix material in a proportion of at least 75 mol % and at least one dopant in a proportion in the range from 1 mol % to 25 mol %.

Coating source for producing doped carbon layers

The present invention concerns substrates coated with an MoSiBlayer, said layer comprising the T2 phase, and a method for the production thereof.

Mo&#x2014;Si&#x2014;B layers and method for the production thereof

A target, in particular a sputtering target, includes a target plate of a brittle material and a back plate. The back plate is connected to the target plate over an area and the target plate has micro cracks which pass through from the front side to the rear side of the target plate and divide the target plate into adjacent fragments. A process is also provided for producing such a target which is suitable, in particular, for the use of extremely high power densities. A vacuum coating process uses at least one such target as a sputtering target and as a result particularly high power densities can be used on the target during the sputtering.

Sputtering target

A tubular target formed of molybdenum or a molybdenum alloy has an oxygen content of less than 50 &#x3bc;g/g, a density of greater than 99% of the theoretical density, and an average grain size of less than 100 &#x3bc;m. The molybdenum or molybdenum alloy tube may be produced by extrusion. In one embodiment, the molybdenum tube has a backing tube of titanium or titanium alloy. In an embodiment, the molybdenum tube has a varying wall thickness with an increase towards its ends.

Tubular target and production method

A coating including a multilayer film, which includes a multi-layered structure including layers of the type I and layers of the type II. The layers of the type I are metal nitride with a chemical composition given by the formula Me1Me2ZI and the layers of the type II are a Mo-comprising material with chemical composition given by the formula MoSiBZII or MoSiB. Also described is a method for depositing the above mentioned coating.

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Reutte, Austria

Peter Polcik