Asml Netherlands B.v.

Peter Paul Steijaert

Engelbertus Antonius Fransiscus Van Der Pasch

Jan Steven Christiaan Westerlaken

Franciscus Van De Mast

Gerardus Arnoldus Hendricus Franciscus Janssen

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Hans Jansen

Wilhelmus Josephus Box

Ruud Antonius Catharina Maria Beerens

Albertus Adrianus Smits

Jeroen Johannes Sophia Maria Mertens

Johannes Henricus Wilhelmus Jacobs

Youri Johannes Laurentius Maria Van Dommelen

Gheorghe Tanasa

Jimmy Matheus Wilhelmus Van De Winkel

Robert Douglas Watso

Maurice Martinus Johannes Van Der Lee

Emiel Jozef Eussen

Joao Paulo Da Paz Sena

Henricus Martinus Dorotheus Van Lier

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Nicolaas Ten Kate

Joost Jeroen Ottens

Nicolaas Rudolf Kemper

Marco Koert Stavenga

Frits Van Der Meulen

Hernes Jacobs

Emiel Jozef Melanie Eussen

Noud Jan Gilissen

Marcus Martinus Petrus Adrianus Vermeulen

Anthonius Martinus Cornelis Petrus De Jong

Peter Smits

Pieter Renaat Maria Hennus

Jan Cornelis Van Der Hoeven

Hubert Matthieu Richard Steijns

Antonius Martinus Cornelis Petrus De Jong

Harmen Klaus Van Der Schoot

A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

Lithographic apparatus having an encoder type position sensor system

Lithographic apparatus having encoder type position sensor system

Lithographic apparatus having an encoder position sensor system

A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.

Substrate support and lithographic process

An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.

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Eindhoven, Netherlands

Peter Paul Steijaert