Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Friedrich-schiller-universitaet Jena

Friedrich-schiller-universitat Jena

Siteco Gmbh

Fresnel Optics Gmbh

Southwall Europe Gmbh

Peter Munzert

Ulrike Schulz

Norbert Kaiser

Friedrich Rickelt

Heiko Knopf

Matthias Fahland

Waldemar Schoenberger

Kevin Füchsel

Klaus Stockwald

Dirk Salz

Stefan Kotter

Mark Schürmann

Reinhard Schaefer

Paul Braun

Stefan Schwinde

Ronny Kleinhempel

Hanno Heiße

Hanno Heiβe

Sabrina Wolleb

Martin Bitzer

Antje Kaless

Michael Scheler

Irmina Wendling

Sven Stempfhuber

Dieter Gäbler

Paul Schmitt

Waldemar SCHÖNBERGER

Marion Gebhardt

Werner Hofmann

A method for producing an aluminum layer is provided. The method includes depositing a metallic seed layer on a substrate, the seed layer having a thickness of not more than 5 nm, and also includes applying the aluminum layer to the seed layer, wherein the aluminum layer has a thickness of more than 30 nm. Further, an optical element, which can be a mirror layer, is provided including the metallic seed layer and the aluminum layer.

Optical element having metallic seed layer and aluminum layer, and method for producing same

A method for producing a reflection-reducing layer system is disclosed. In an embodiment, a method includes depositing an organic layer on the substrate, generating a nanostructure in the organic layer by a plasma etching process, applying a cover layer to the nanostructure, wherein the organic layer, the nanostructure and the cover layer together form a reflection-reducing structure, wherein the cover layer comprises an inorganic material or an organosilicon compound, and wherein the cover layer is at least 5 nm thick and performing a post-treatment after applying the cover layer, wherein a material of the organic layer is at least partially removed, decomposed or chemically converted, and wherein an effective refractive index nof the reflection-reducing structure after the post-treatment is smaller than an effective refractive index nof the reflection-reducing structure before the post-treatment.

Method for producing a reflection-reducing layer system

A reflector element and a method for manufacturing a reflector element are disclosed. In an embodiment the reflector element includes a plastic substrate and a silver layer arranged on the plastic substrate. The reflector element further includes a first barrier layer arranged on the silver layer, wherein the barrier layer has an at least 15 nm-thick oxide layer and a second barrier layer arranged on the first barrier layer, wherein the barrier layer includes siloxane, and wherein a thickness of the second barrier layer is at least 250 nm and at most 450 nm.

Reflector element and a method for manufacturing same

An optical element is disclosed. In an embodiment an optical element includes a substrate having a silicone surface, an antireflection layer overlying the silicone surface, wherein the antireflection layer comprises a first organic layer having a reflection-reducing nanostructure, the nanostructure having a depth of at least 30 nm, and a cover layer overlying the first organic layer, the cover layer having a thickness of no more than 40 nm.

Optical element

A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.

Method for producing a reflection-reducing layer system and reflection-reducing layer system

A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.

Method for producing an antireflection layer on a silicone surface and optical element

A plastic substrate having a porous layer is disclosed. In an embodiment, the porous layer is formed at least partially from a material of the plastic substrate and has pores. The proportion by volume of pores is greater in a first region of the porous layer than in a second region of the porous layer. The second region follows the first region, as seen proceeding from the plastic substrate. The porous layer can be produced by a plasma process that simultaneously effects structuring of the plastic substrate by ion bombardment and coating of the plastic substrate.

Plastic substrate having a porous layer and method for producing the porous layer

A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

A plastic substrate has a porous layer on a surface. The porous layer is formed at least partially from a material of the plastic substrate and has pores. The proportion by volume of pores is greater in a first region of the porous layer than in a second region of the porous layer. The second region follows the first region, as seen proceeding from the plastic substrate. The porous layer can be produced by a plasma process that simultaneously effects structuring of the plastic substrate by ion bombardment and coating of the plastic substrate.

A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process.

Method for producing an antireflection coating

A reflection-reducing interference layer system is disclosed, which has at least three alternating layers having different refractive indices. At least one nanostructured layer comprising an organic material or an organic-inorganic hybrid material is applied to the alternating layers. With the interference layer system, it is possible to obtain very low reflection over a wide wavelength and incident angle range.

Reflection-reducing interference layer system and method for producing it

In a process for the fabrication of a radiation-absorbing optical element that contains a substrate () of plastic, a layer with a graduated refractive index () is fabricated on at least one surface () of the substrate () using a plasma etching process, after which a metal layer () is applied on top of the layer with a graduated refractive index ().

Method for producing a radiation-absorbing optical element and corresponding radiation absorbing optical element

An optical element is provided with a fog reducing polymer layer. A reflection reducing nanostructure is formed on the surface of the fog reducing polymer layer.

Growing community of inventors

Jena, Germany

Peter Munzert