International Business Machines Corporation

Lockheed Martin Corporation

Peter Michael Nichols

Richard Ronald Hall

How Tzu Lin

Robert David Sebesta

Robert Lee Lewis

Francesco Marconi

A method of articulating a sensor comprising the steps applying a friction force on a curved surface of a sensor support frame with a friction drive actuator for pivoting the sensor support frame about a pivot point for altering an elevation and azimuth angle of the sensor. The sensor may be maintained at a predetermined elevation angle while the sensor support frame is pivoted about the pivot point with the friction drive actuator for altering an azimuth angle of the sensor.

Pivoting sensor drive system and method

A system comprises a base having a sensor support frame moveably mounted thereto such that the support frame is pivotal about at least two axes with respect to a pivot point. A sensor is coupled to the support frame. At least one actuator is provided for pivoting the support frame about the pivot point.

Pivoting sensor drive system

Apparatus and method for compensating for distortion of the substrate of a printed circuit workpiece that involves performing two tasks. First, a mask that carries functional circuit features and alignment features is positioned rotatably so that the mask alignment features, when projected onto a table that holds the printed circuit workpiece, will be on a line extending parallel to one of two orthogonal axes of the table. Second, the spacing of alignment features on the printed circuit workpiece is determined and this determination is a measure of the distortion of the printed circuit workpiece substrate. A lens through which the mask image is projected is moved to adjust the magnification of the image in accordance with the measured distortion of the substrate of the printed circuit workpiece.

Apparatus and method for compensating for distortion of a printed circuit workpiece substrate

A photolithography imaging system and method that performs the tasks of mask alignment, panel recognition, establishing position offsets and adjusting mask rotation for accurate overlay imaging of the mask onto the panel, and correctly adjusting image magnification or reduction to properly size each stepped image to the panel distortion. This invention applies more directly to substrate panels whose dimensional stability is found difficult to control, repeatedly. More specifically, it applies to panels whose X axis distortion factor varies greatly from its Y axis distortion factor and the average adjustment of the image magnification or reduction does not satisfy tight registration requirements. What is new is that the calculation of the magnification or reduction adjustment is based on the mask image dimensions.

Method and system of distortion compensation in a projection imaging expose system

A vacuum fixture incorporating a vacuum suctioning device which may be employed in the manufacture of thin film chip carriers through the intermediary of retaining parts which are to be processed on the surface of a suction plate in a dimensionally compensating operative mode. A process is disclosed which may be employed in the manufacture of thin film chip carriers which is adhered in a dimensionally compensating manner to the surface of an interposer plate which is supported on a suction plate of a vacuum fixture.

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Johnson City, NY, United States of America

Peter Michael Nichols