Leybold Aktiengesellschaft

Leybold-heraeus Gmbh

Unaxis Trading Ag

Leybold Hearaeus Gmbh

Balzers Prozeb-systeme Gmbh

Peter Mahler

Michael Scherer

Wolfgang Stang

Roland Gesche

Klaus Michael

Rainer Gegenwart

Wolfram Maass

Herbert Naehring

A workpiece holding device for a vacuum unit has coolable or heatable transfer plates ( ) displaceable independently of one another in a baseplate ( ) and each comprising a heat transfer surface ( ) which is surrounded by an O-ring ( ), is connected to a pipe ( ) and, with a workpiece ( ) which is pressed against the O-ring ( ) by a holder ( ), encloses a gap ( ). The holder ( ) can be locked to the baseplate ( ). After lowering of the holder ( ) into a closed position and load-free locking to the baseplate ( ), the heat transfer plates ( ) are pneumatically raised until in each case a stop ( ) becomes effective between said heat transfer plates and the holder ( ) and determines the width of the gap ( ). The gap ( ) is then filled via the pipe ( ) with a heat transfer medium, e.g. helium. After processing of the workpiece ( ), the heat transfer plates ( ) are lowered and the holder ( ) is released again in a loadfree manner.

Heat-exchanging workholder for a vacuum unit

In an apparatus for coating substrates (9), especially with magnetizable materials such as NiFe, with a circular, disk-shaped, rotatably supported substrate holder (3), which is subjected to an HF bias voltage, which is provided around its circumference and on the back with dark-space shield (1), and which rotates under at least one opposing cathode (7), and with a device for generating a magnetic field (13) parallel to the plane of the substrate (9), the magnetic field is generated by an electromagnet, the exciter coil of which, together with the lower part of the yoke (10), is housed in the dark-space shield (1), whereas the extended pole pieces (12, 12'), which are electrically insulated from the coil yoke (10) via the dark space gap (2), are housed in the substrate holder (3) in proximity to the substrate (9).

Apparatus for coating substrates especially with magnetizable materials

Modular vacuum system includes functional units arranged in tandem to form two parallel transport paths which connect at one end of the system. Each unit includes a housing milled from a single block of metal having external walls, an internal wall, and side-by-side openings which align with side-by-side openings in an adjacent unit.

Modular vacuum system for the treatment of disk-shaped workpieces

In a coating apparatus, a sputter cathode (1) has, directly side by side, two electrodes (2, 3) connected in common to a high-frequency generator and having each a target (9, 10). The targets (9, 10) of both electrodes (2, 3) abut one another each with a straight edge (11, 12). A dark space shield surrounds both electrodes (2, 3) and targets (9, 10) together.

Dual cathode sputter coating apparatus

A vacuum chamber houses a rotatable substrate holder next to a door having a cathode target mounted therein. A plate-like mask is movable to a position between the substrate holder and the door so that the target can be cleaned without contaminating the substrate. The mask is preferably moved by a screw jack including a tube driven through a sealed hole in the chamber wall.

Apparatus for treating substrates in a vacuum chamber

Apparatus for the coating and etching of substrates in a vacuum chamber (4), includes a cathode (17, 17') having a target (18, 18'), and a rotatable structure (8) shaped as an essentially cylindrical hollow body having circular disk-shaped end faces provided with pivot shafts (10, 10') held for rotation about a horizontal axis (r) in bearings (11, 11') disposed on the side walls (12, 12') of the vacuum chamber (4). Mountings (19, 19') for holding the substrates in place are provided on the circumference of the hollow body, the cathode (17, 17') and the etching anode (16) being disposed opposite the rotatable structure (8) in a plane (E) running horizontally and approximately in the plane of the axis of rotation (r).

Apparatus for coating and/or etching substrates in a vacuum chamber

A rectangular substrate bed has on its top surface a row of disk-shaped holding members on which disk-shaped substrates are laterally positioned by a frame member having circular openings which expose the substrates. Seals are provided on each holding member so that substrates can be held in place by vacuum. The frame member is fixed to the substrate bed by clamps having pins which are received in bores at opposite ends of the substrate bed and the frame member.

Apparatus for holding disk-shaped substrates in the vacuum chamber of a

A flat rectangular substrate bed (3) having opposed parallel endwalls (14) and parallel sidewalls (16) receives a pair of clamping jaws (4) each having an L-shaped cross-section with a short limb against each sidewall and a long limb extending halfway over the top surface of the substrate bed. The long limbs (6) have arcuate recesses (7) which cooperate to surround the substrates (2) and thereby center and hold them. The two clamping jaws (4) are held by end bars (11) which are tightly joined to the substrate bed (3) by means of pins (10) and (12) received in respective bores (9) in the jaws and (13) in the endwalls.

Device for holding disk-shaped substrates in the vacuum chamber of a

Apparatus for transporting substrates 22, 23 in vacuum deposition systems with several stations, comprising plate-like substrate holders 16 which are moved across the stations in a vertical position along a given path and have two rails which interact with two rows of rollers provided underneath the substrate holders. The side of the first rail 13 facing away from the substrate holder 16 has a longitudinal groove 13a which interacts with rollers 7, 7', 7', . . . which are rotatably disposed at the frame 4 of the apparatus and disposed in a first row where they are spaced apart. The second rail 14 runs parallel to the first one and has a planar bearing surface 14a the plane E.sub.2 of which intersects the rotating axes V.sub.a of the first row at a right angle and approximately traverses the center of gravity S of the substrate holder 16. The bearing surface 14a interacts with S rollers 8, 8', . . . which are disposed in a second row and at the bottom of the frame 4 where they rotate around vertical axes 1.sub.a. A vertical plane E.sub.1 in the longitudinal groove 13a of the first rail 13 is laterally offset with respect to plane E.sub.2 of the planar bearing surface.

Apparatus for transporting substrates

In a device for transporting substrates in vacuum coating systems with several stations, comprising several substrate holders 16 of plate-like configurations which can e moved across the stations along a prescribed path of transportation in a vertical position and which interact with rails 13, 14 being provided in the area of their foot part 15 below the substrates 22, 23 to be mounted to the substrate holders 16, the foot part 15 of the substrate holder 16 has a pair of rails 13, 14 spaced parallel apart and disposed in a vertical plane. The smaller sides thereof, which face one another, have longitudinal grooves 13a, 14 which correspond with rollers 7, 8 or sliding pads being disposed stationary on the bottom part of the device and being provided in rows corresponding to the course of the grooves and in planes that are on top of each other and spaced vertically apart. The substrate holder 16 has a shaft-like recess 24 which extends from the top downward into the area of the foot part 15 parallel to the rails and into which, while passing the station, extends a flat heating device 11 extending vertically toward the bottom and disposed above the substrate holder 16 at the top wall part 4a. The substrate holder 16 surrounds the heating device 11 in a U-shaped manner.

Apparatus for transporting substrates in a vacuum coating system

In an apparatus for the treatment of substrates supplied in cassettes, with a series of lock chambers and treatment chambers, with a transport system for transporting at least one substrate holder through the chambers, and with a loading station, the problem of loading the apparatus with substrates from a moving belt without the need to hold the substrates in form-fitting mountings is solved as follows: (a) the substrate holders are constructed so as to hold one substrate at a time at an acute angle to a vertical plane, and (b) the loading station has a means for shifting at least one cassette and a manipulator system whereby the movements of extracting the substrate from the cassette and inserting it into the cassette can be performed in the perpendicular direction and whereby the substrate can be brought by a rotation of 90 degrees into a slanting position which corresponds substantially to the position of the receiving plane of the substrate.

Apparatus for the quasi-continuous treatment of substrates

Cathode sputtering apparatus with at least two adjacently arranged stations including a charging station and a coating station. At least one sputtering cathode and a substrate carrier that can execute reciprocatory movement between the stations are arranged on a vacuum chamber. The substrate carrier is secured by means of an extension arm eccentrically on a pivot bearing passing through the vacuum chamber. A coolant circulation line is led through the pivot bearing to the substrate holder.

Cathode sputtering apparatus with adjacently arranged stations

A device for holding one or more substrates, each of substantially circular profile, especially in vacuum coating apparatus. In a vertical plate there is provided an opening on whose edge holding means are provided into which each substrate is fitted. In accordance with the invention, the opening has in its bottom area an approximately semicircular radial groove which is defined on both sides by semicircular rims. In its upper portion the opening has on one side a lip which merges with one of the rims in the lower part of the opening. On the other side there is disposed a counterbore offset eccentrically upward from the opening, whose radius is at least as great as the radius of the groove bottom. In this manner an insertion opening is formed on one side of the plate for the eccentric insertion of the substrate.

Device for holding a substrate

A vacuum vapor-deposition installation for batchwise operation has a horizontal valve chamber which is arranged in the middle and on which are fitted, by way of suitable openings, a top vaporizing chamber and a lower evaporizing chamber. The two openings are aligned with each other and can be sealed simultaneously in a vacuum-tight manner by a two-way valve movable horizontally in the valve chamber. For the purpose of charging the vaporizing chamber with substrates, this chamber can be lifted from the valve chamber. To solve the problem of increasing the number of production cycles per unit of time, the interior of the evaporizing chamber is accessible from the exterior without interrupting the vacuum in the valve chamber. This measure renders it unnecessary to charge the evaporizer in the evaporizing chamber through the valve chamber, for which purpose the entire chamber would have to admit air.

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Hainburg, Germany

Peter Mahler