Lambda Physik Ag

Lambda Physik Gesellschaft Zur Herstellung Von Lasern Mbh

Lambda-physik Forschungs-und Entwicklungs Gmbh

Lambda Physik Gessellschaft Zur

Lambda Physik Gesellschaft Zur Herstelling Von Lasern Mgh

Lambda Physik Gesellschaft Zur Herstellung Von Lasern Mgh

Peter Lokai

Uwe Stamm

Juergen Kleinschmidt

Klaus Wolfgang Vogler

Vadim Berger

Stefan Borneis

Ingo Klaft

Thomas Schroeder

J&uuml;rgen Kleinschmidt

Konstantin Aab

Sergei V Govorkov

Dirk Basting

Jurgen Kleinschmidt

Heribert Rosenkranz

Matthias Ulrich

Peter Genter

Farid Seddighi

A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.

Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp

A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.

Resonator arrangement for bandwidth control

Some of the key optical components of lithography lasers are very sensitive to intensive UV radiation. Intensive UV radiation can cause color center formation in these components. The color centers are reason for laser energy dropping, worse laser-bandwidth and limited life-time. The on-line monitoring of the color-center formation during operation of the lithography lasers detecting laser induced fluorescence and investigation of the fluorescence spectrum can be helpful for maintenance of lithography lasers. The fluorescence signal is analyzed and delivers information about optics quality.

On-line quality control of the key optical components in lithography lasers using laser induced fluorescence

An excimer or molecular fluorine laser system includes a laser chamber filled with a gas mixture at least including a halogen-containing species and a buffer gas, multiple electrodes, including a pair of main discharge electrodes and at least one preionization electrode, within the laser chamber and connected to a discharge circuit for energizing the gas mixture, and a resonator including a line-narrowing and/or selection module for generating a laser beam at high spectral purity. The line-narrowing module includes one or more line-narrowing and/or selection optics within a sealed module coupled to vacuum equipment through a vacuum port for reducing the pressure within the module,

Method and apparatus for reduction of spectral fluctuations

A F -laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.

Wavelength and bandwidth monitor for excimer or molecular fluorine laser

A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F -laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

Method and apparatus for wavelength calibration

An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively.

Narrow band excimer or molecular fluorine laser having an output coupling interferometer

An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. The resonator includes an interferometric device, which may be a resonator reflector such as an output coupling interferometer or HR reflector, or a transmissive intracavity component, including a pair of opposing reflecting surfaces tuned to produce a response maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is preferably configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress at least one side band or outer portions of the response maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively, and may be cylindrical, Gaussian or spherical, and the curvature may extend over the entire reflecting surface or diameter of the incident beam. The curved surface may be part of a component that couples with a base optical block at a surface opposing the other reflecting surface, such as by a slot defined in the optical block or using an adhesive.

A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F,-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F.sub.2 -laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

A source of narrow-band coherent radiation has a first optical parametric oscillator (OPO 1) for producing seed radiation, and a second optical parametric oscillator (OPO 2), into which the seed radiation is input after passing through a wavelength-selective element (G). In order to stabilize and adjust the bandwidth of the radiation (14) emitted by the second optical parametric oscillator (OPO 2), radiation of this type is also input into the wavelength-selective element (G) and thereby analyzed, in order, in accordance with the analysis, to adjust the wavelength-selective element or the OPO 2.

Production of narrow-band coherent radiation by using at least one

A laser arrangement for generating narrow-band, tunable coherent radiation has an optical parametric oscillator (10) and a tunable seed oscillator (20) whose emitted seed radiation can be set in a narrow-band fashion by means of at least one wavelength-selective element (30). In order to achieve simple tunability of the output radiation (38) of the OPO in conjunction with a narrow bandwidth, good spatial beam quality and high beam intensity without maladjustment of the OPO resonator, the lineshape, set using the wavelength-selective element (30), of the seed radiation I.sub.seed (.lambda.), and the intensity transmission function T.sub.opo, (.lambda.) of the non-pumped resonator (12, 14) of the OPO (10) are set in such a way that given tuning of the center wavelength .lambda..sub.max seed of the seed oscillator (20) in the middle between two neighboring transmission maxima of the intensity transmission function T.sub.opo (.lambda.) it holds for all wavelengths .lambda. not equal to .lambda..sub.max seed that:

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Goettingen, Germany

Peter Lokai