International Business Machines Corporation

Peter L Balzer

Robert David Sebesta

Robert Lee Lewis

A multilayer circuit fabrication approach and circuitized substrate are presented wherein at least two conductive layers are formed over a substrate. The conductive layers are separated by a first dielectric layer and the structure is encapsulated with a second dielectric layer. The first dielectric layer includes open areas exposing a portion of the underlying support structure aligned to those areas where contact points are to reside in the second conductive layer. The first dielectric layer comprises a blanket dielectric layer such that recesses are defined in the upper surface thereof aligned to the open areas of the first conductive layer. The second conductive layer thus resides in two planes, both of which comprise planes other than a plane of the first conductive layer. A plurality of openings can be simultaneously formed to expose contact points in both the first and second conductive layers.

Multilayered circuitized substrate and method of fabrication

A method of aligning an image at a desired position on a substrate support including providing a radiation source producing desired wavelengths of radiation. A fluorescing medium is provided on a substrate support. The radiation is directed toward the substrate support. At least one filter is positioned between the radiation source and the substrate support. A mask is positioned between the radiation source and the substrate support. The mask selectively transmits the radiation. The substrate support is irradiated with the radiation, thereby causing the fluorescing medium to fluoresce. A position of the radiation impacting upon the substrate support is detected with at least one detector by detecting an image of the fluorescing medium. A signal corresponding to the detected position of the radiation is produced. The detected position of the radiation is compared with a desired position of radiation impinging upon the substrate support to determine whether a deviation of the position of the radiation on the substrate support away from a desired position in a direction perpendicular to the radiation exists. A signal corresponding to comparison is produced. If a deviation exists, the position of the radiation source, the mask and the substrate support are altered relative to each other in accordance with the signal in the direction perpendicular to the radiation so as to cause the position of the radiation on the substrate support to substantially correspond to the desired position.

Automated mask alignment for UV projection exposure system

An apparatus for aligning an image on a substrate support. A substrate support supports a substrate to be treated by radiation. At least one radiation source produces desired wavelengths of radiation to treat the substrate. The radiation is directed toward the substrate support. At least one filter filters selected wavelengths of the radiation. The filter is positioned between the substrate support and the radiation source. A mask selectively transmits the radiation. The mask is positioned between the radiation source and the substrate support. At least one detector detects a position of radiation impinging upon the substrate support and produces a signal corresponding to the sensed position. The detected position is compared with a desired position of radiation impinging upon the substrate support. The detected position is compared to the desired position and a signal is produced corresponding to the comparison. A positioner positions the substrate support in a desired position for treating the substrate. The positioning means receives the signal from the comparing means and alters, when necessary, in a direction parallel to a surface of a substrate supported by the substrate support, the position of the substrate support and the radiation source, mask, and filter relative to each other in accordance with the signal so that the sensed position corresponds to the desired position.

Growing community of inventors

Chenango Forks, NY, United States of America

Peter L Balzer