Carl Zeiss Smt Gmbh

Peter Kloesch

Markus Weiss

Jochen Weber

Martin Mahlmann

Benjamin Sigel

Andreas Bertele

Michael Ringel

The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Projection exposure apparatus for semiconductor lithography including an actuator system

A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.

Device for damping vibrations in projection exposure apparatuses for semiconductor lithography

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Oberkochen, Germany

Peter Kloesch