International Business Machines Corporation

Peter Kerns

Guy M Cohen

Christian Lavoie

Teodor Krassimirov Todorov

Nicholas Anthony Lanzillo

Oki Gunawan

Nathan P Marchack

Ching-Tzu Chen

Utkarsh Bajpai

An interconnect structure including conducting layers of topological semi-metals and/or topological insulators. To increase charge carrier density in the conducting layers, a charge carrier doping layer present on at least one surface of the one or more conductive layers of topological semi-metals. The charge carrying doping layers have a charge carrier density greater than the topological semi-metals and/or topological insulators of the one or more conductive layers.

Multi-layer topological interconnect with proximal doping layer

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Sandy Hook, CT, United States of America

Peter Kerns