Ims-ionen Mikrofabrikations Systeme Gmbh

Universitat Gesamthochschule Kassel

Ustav Pocitacovych Systemov, Slovenska Adademia Vled

Peter Hudek

Hans Loschner

Ivaylo W Rangelow

Pavol Hrkut

In order to process a carbon film carbon is deposited on a substrate by sputtering from a carbon sputter target in a gas mixture which contains nitrogen in a minimum proportion of 20% and a sputter gas at a predetermined gas pressure and the substrate is then subjected under a high vacuum to thermal treatment at a temperature above 100.degree. C. The carbon films produced in this manner comprise a fiber and/or tube structure which extends substantially perpendicular to the film.

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Bratislava, Slovakia

Peter Hudek