Asml Netherlands B.v.

Peter Hoekstra

Engelbertus Antonius Fransiscus Van Der Pasch

Erik Roelof Loopstra

Hans Butler

Andre Bernardus Jeunink

Marc Wilhelmus Maria Van Der Wijst

Emiel Jozef Melanie Eussen

Marinus Aart Van Den Brink

Michael Jozef Mathijs Renkens

Carolus Johannes Catharina Schoormans

Jeroen Dekkers

Renatus Gerardus Klaver

Martijn Robert Hamers

Boudewijn Theodorus Verhaar

Georgo Angelis

A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.

Method for calibration of an encoder scale and a lithographic apparatus

In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.

Lithographic apparatus and calibration method

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Veldhoven, Netherlands

Peter Hoekstra