Asml Netherlands B.v.

Peter Franciscus Wanten

Hans Jansen

Anthonius Martinus Cornelis Petrus De Jong

Marco Koert Stavenga

Johannes Wilhelmus Jacobus Leonardus Cuijpers

Martinus Hendrikus Antonius Leenders

Bauke Jansen

Kornelis Tijmen Hoekerd

Raymond Gerardus Marius Beeren

Antonius Johannus Van Der Net

Teunis Cornelis Van Den Dool

Jacques Cor Johan Van Der Donck

Jan Willem Cromwijk

Robert Douglas Watso

Nadja Schuh

Joost Jeroen Ottens

Johannes Henricus Wilhelmus Jacobs

Koen Jacobus Johannes Maria Zaal

Frits Van Der Meulen

Richard Joseph Bruls

Leon Martin Levasier

Marinus Aart Van Den Brink

Frederik Eduard De Jong

Marcel Hendrikus Maria Beems

Edwin Cornelis Kadijk

Jan Cornelis Van Der Hoeven

Johannes Wilhelmus De Klerk

David Lucien Anstotz

Marteijn De Jong

Richard Bernardus Johannes Droste

Raymond Gerardus Marlus Beeren

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Lithographic apparatus and contamination removal or prevention method

An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.

Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method

An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.

Lithographic apparatus and device manufacturing method

A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.

Cleaning device and a lithographic apparatus cleaning method

An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.

Lithographic apparatus and lithographic apparatus cleaning method

Growing community of inventors

Mierlo, Netherlands

Peter Franciscus Wanten