U.S. Philips Corporation

Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Peter Ferdinand Greve

Johannes Onvlee

Willem G Opheij

Albert Smid

Johannes Hendrikus Gertrudis Franssen

Christiaan H Velzel

Josephus J Braat

Gijsbertus Bouwhuis

Olaf Thomas Johan Antonie Vermeulen

Michael Cornelis Van Beek

Raimond Visser

Kornelis A Immink

Albert Bijlsma

Willem Jannis Rosier

Erwin Theodorus Jacoba Verhagen

Hendrik T Lam

A lithographic apparatus has an illumination system that conditions a beam of radiation. A patterning support supports a patterning device, which serves to impart the beam of radiation with a pattern in its cross-section. A substrate support holds a substrate. A projection system projects the patterned beam of radiation onto a target portion of the substrate. A particle detection system detects a particle on a surface of an object. The particle detection system has a radiation source, which generates an illumination beam of radiation. The illumination beam of radiation is directed along a first optical path to a detection area at the surface of the object. A radiation detector receives a detection beam of radiation from the detection area along a second optical path. The length of the first optical path is made substantially equal to the length of the second optical path.

Particle detection system, and lithographic apparatus provided with such particle detection system

The present invention relates to an analysis apparatus, in particular a spectroscopic analysis apparatus, for analyzing an object, such as blood of a patient, and a corresponding analysis method. To aim the confocal detection volume inside a blood vessel orthogonal polarized spectral imaging (OPSI) is used to locate blood capillaries in the skin. An imaging system (img) with slightly shifted imaging planes (i, i) for OPS imaging of blood vessels is proposed to provide auto-focusing. The confocal Raman detection plane (dp) is located in between these two imaging planes (i, i). Based on measured amount of defocus for the imaging planes (i, i), the focusing of the imaging system (img), the excitation system (exs) for exciting the target region and the detection plane (dp) is located inside the blood vessel (V). Thus, continuous auto-focusing with high accuracy can be achieved. The invention relates also to an optical tracking system for continuously tracking a point of a moving object (obj).

Spectroscopic analysis apparatus and method with excitation system and focus monitoring system

The focus of an optical system () can be determined in a reliable and accurate way by arranging a first and second test object () having a periodic structure at different sides of the focal plane () of the optical system and determining the difference in modulation depth of the images formed on different areas () of a radiation-sensitive detection system ().

Method of and apparatus for determining focus of an imaging system

To enable differentiation between a particle and a ghost particle, a detector system is presented. The detector system is configured to output at least two detector signals corresponding to an intensity of radiation being incident on the detector system. If radiation is received from a ghost particle, not all of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a contaminating particle results in all signals having a level above a threshold level. Thus, it may be determined with a high accuracy whether a particle or a ghost particle is redirecting radiation towards the detector system.

Particle detection device, lithographic apparatus and device manufacturing method

To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level. The detector system may include a radiation detector device configured to generate the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device and a radiation blocking assembly configured to prevent radiation not originating from a particle from being incident on the predetermined part of the detector device.

A projection device comprises a matrix () of semiconductor lasers, an optical system () for projecting the matrix () on an element () illuminated by the projection device, and a control device () for controlling the semiconductor lasers through a feedback device. The feedback device comprises a first detector () that generates a first signal representing the detected intensity. The semiconductor lasers are controlled and the intensity of the light spot is adjusted to a desired value by the feedback device. Light from a semiconductor laser is detected by a second detector (), and a value of the detected signal is stored in an addressable memory cell. The amount of emitted light is stabilized for each semiconductor laser by detection through the second detector () and comparison with the value stored in the memory () for the relevant controlled semiconductor laser.

Output stabilization for a laser matrix

A height meter for measuring the height of a first surface of a transparent object is described, which height meter comprises a radiation source for supplying a converging measuring beam whose chief ray extends at an angle to the normal on the surface, and a radiation-sensitive detection unit for detecting a radiation beam reflected by the surface to be measured. Since a diaphragm is arranged in the path of this beam, it is prevented that radiation reflected by a second surface situated opposite the first surface can reach the detection unit. The height meter is notably suitable for an inspection device for a lithographic mask.

Optical height meter, surface-inspection device provided with such a

A description is given of an optical inspection device for inspecting two oppositely located surfaces (3, 4) of a transparent object (1), for example a lithographic mask. The device is constructed in such a manner that for each inspection beam (a, c) the radiation path to the surface to be inspected (3, 4) is substantially equal to the radiation path from the surface to be inspected to a detector (29, 40), so that these paths comprise the same scanning element (10), preferably a mirror polygon. By virtue thereof, the radiation spots formed on the detectors are stationary and an inspection signal having a good signal-to-noise ratio is obtained.

Optical inspection device and lithographic apparatus provided with such

A component-detection device for use in a component-mounting machine is described, which device comprises a foreground illumination system and a camera (30), this illumination system comprising at least an optical guide (40) arranged between the component (10) and the camera, and an associated set of radiation sources (45, 46, 47, 48) irradiating the optical guide. This provides a uniform foreground illumination for the component and a reliable detection of this component.

Device for detecting an electronic component, and component-mounting

Scanning apparatus for a magneto-optical record carrier includes an integrated beam separating and beam splitting element consisting of a supporting body (30) on the surfaces of which are a semi-transparent mirror (22) and a polarization-sensitive beam-splitting layer (26). The semi-transparent mirror separates the scanning beam from the beam reflected from the record carrier. The beam-splitting layer splits the reflected beam into orthogonally polarized sub-beams (27 and 28) which are incident on respective photodiodes or on different regions of a single multiple photodiode. The supporting body may be of a birefringent material which provides orthogonally polarized beam-splitting, in which case the beam splitting layer may be omitted.

Scanning apparatus with integrated beam separating and beam-splitting

An optical scanning device is described which comprises a radiation source (6), an objective system (8) and a diffraction grating (9) which is arranged between the objective system and the radiation source to separate the radiation beam (b') reflected by the information surface (2) to be scanned from the beam (b) emitted by the radiation source and for introducing astigmatism in the reflected beam (b') for the purpose of focus-error detection. In principle, the grating (9) has a constant grating period and is arranged at a small angle (.alpha.) in the beam (b').

Device for scanning a radiation-reflecting information surface with

An opto-electronic focussing-error detection system is described for detecting a deviation between a radiation-reflecting surface and a plane of focussing of an objective system in an optical imaging system. The detection system comprises a beam-splitting element and a radiation-sensitive detection system arranged behind the beam-splitting element and two groups of detectors. The first group is associated with a first sub-beam and the second group with a second sub-beam of two sub-beams formed by the beam-splitting element. The beam-splitting element is a compound wedge comprising two wedge sections having a common base surface and each having an upper surface situated opposite the base surface. The upper surfaces are inclined relative to each other in the plane of the interface between the two wedge sections with that plane extending substantially perpendicularly to the base surface and to the upper surfaces and containing the optical axis of the imaging system. The two groups of detectors are each situated one side of a plane containing the optical axis and extend substantially perpendicularly to the interface.

Opto-electronic focussing-error detection system with a compound wedge

An apparatus as described for reading an optical radiation-reflecting information carrier, which apparatus comprises an opto-electronic focussing error detection system with two focussing detectors. The path of the read beam which has been reflected by the information carrier and which originates from the read spot includes a single radiation-deflecting element, in such a way that the radiation which is incident on this element is deflected towards the focussing detectors.

Apparatus for reading an optical radiation-reflecting information

An apparatus is described for reading an optically encoded radiation-reflecting information carrier, using an opto-electronic focussing error detection system. The path of the read beam which is directed towards the information carrier includes a radiation-deflecting element producing a narrow focussing beam that co-operates with two focussing detectors to produce an error signal.

Apparatus for reading an optical radiation-reflecting record carrier

An apparatus is described for reading a record carrier on which information is stored in an optically readable reflecting structure. By projecting two radiation spots one before and one behind the plane of the information structure, it is possible to ascertain whether a read beam is properly focussed on the information structure. An optical wedge-field lens combination extends the range of operation of the focus correction device.

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Eindhoven, Netherlands

Peter Ferdinand Greve