Süss Microtec Photomask Equipment Gmbh & Co. Kg

Steag Hamatech Ag

Infineon Technologies Ag

World Precision Instruments, Inc.

Steag Hamatech Ape Gmbh & Co. Kg

Suss Microtec Photomask Equipment Gmbh & Co

Suss Microtec Solutions Gmbh & Co. Kg

Hamatech Ape Gmbh & Co. Kg

Peter Dress

Uwe Dietze

Peter Grabitz

Jakob Szekeresch

Werner Saule

Robert Weihing

SherJang Singh

Mathias Belz

Marlene Strobl

Anatol Schwersenz

Sherjang Singh

Andreas Nöring

Christian Bürgel

Martin Tschinkl

Karl Friedrich

Karl Appich

Peter Krauss

Sherjang Sing

Karsten Branz

Michael c/o Hamatech Ape Gmbh & Co Kg Sowa

Thomas Gairing

An apparatus includes a housing having an elongated chamber, an inlet opening extending into the chamber, and a slit shaped outlet opening. A tube element extends in a longitudinal direction through the chamber and is at least partially transparent to UV radiation. The tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber. At least one UV-radiation source in the tube element is arranged to emit UV-radiation in the direction of the flow space and through the outlet opening out of the housing to generate radicals in the liquid and bring the radicals to the substrate surface. Means are provided for adjusting the radiation exiting the outlet opening through the tube element such that the intensity of the radiation increases towards the longitudinal center plane of the chamber.

Device for applying to a substrate a liquid medium which is exposed to UV radiation

An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet slits between the tube element and the housing, and at least one UV-radiation source in the tube element, which is arranged to emit UV-radiation in the direction of the flow space and through the outlet opening out of the housing. The apparatus is distinguished by means for causing UV radiation to be emitted primarily in a first wavelength range through a first section of the tube member into the flow space and for causing UV radiation to be emitted primarily in a second wavelength range through a second section of the tube member through the outlet opening of the housing and optionally into an end region of the flow space adjacent to the outlet slits. The first and second wavelength ranges differ, and wherein for at least one of the sections, a maximum of 20%, preferably a maximum of 5%, of the radiation power emitted through the respective section comes from the other wavelength range.

Device for applying a liquid medium which is exposed to UV radiation to a substrate

An apparatus for applying a liquid medium irradiated with UV radiation onto a substrate is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber, and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal centre plane of the chamber, the longitudinal centre plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet silts between the tube element and the housing, and at least one UV-radiation source in the tube element, which is arranged to emit UV-radiation in the direction of the flow space and through the outlet opening out of the housing. The apparatus is distinguished by means which are suitable for influencing the radiation which is emitted by the at least one UV radiation source and exits the outlet opening in such a way that a substantially homogeneous spatial distribution of radicals in a region beneath at least 50% of the outlet opening is formed on the surface of the substrate. In the known design, in a region below the center of the outlet opening, a high radical concentration is formed, which rapidly decreases in a direction transverse to the outlet opening.

Device for applying to a substrate a liquid medium that has been charged with UV radiation

The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid, in order to achieve a desired effect in accordance with the respective method. In one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate. In one method, in which ions are removed from at least partial areas of the surface of a substrate and near surface layers of said substrate, a liquid, which is heated above ambient temperature is applied to the substrate, in order to form a liquid film on at least a partial area of said substrate, wherein electromagnetic radiation is introduced into said liquid film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said hydrophobic surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, whose surface characteristic is to be changed, and UV radiation of a predetermined range of wavelength is guided through said liquid onto at least the partial area of the surface of said substrate, whose surface characteristic is to be changed. The methods may be performed in a common apparatus in any desired order in series and/or in parallel.

Method and apparatus for treating substrates

The application describes several methods and an apparatus for treatment of a substrate. In those methods, at least one liquid is applied thereto and electromagnetic radiation is generated in the liquid by means of radiation before applying the liquid to the substrate. Electromagnetic radiation is introduced into the film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, and UV radiation of a predetermined wavelength is guided onto at least the partial area of the surface of said substrate.

The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly () for applying a liquid to a substrate, said assembly having a nozzle body () comprising a plurality of nozzles () that are substantially arranged in a line and a guide plate () that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles () above the lower edge are directed towards the guide plate () in such a way that a film of liquid forms on the guide plate () and flows over the lower edge ().

Nozzle assembly for applying a liquid to a substrate

To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for each of said heating elements. The method comprises the following steps: locally-analysed measurement of the temperature of the surface of the substrate that faces away from the heating elements, during the thermal treatment; determination of the temperature inhomogeneities occurring on the substrate surface; definition of new desired-value profiles based on said temperature inhomogeneities; and preparation of the new desired-value profiles for subsequent treatments.

Method for thermally treating substrates

To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotated together with the substrate holder, a cover can be secured to the substrate holder and together with the substrate holder forms a sealed chamber for the substrate.

A device and method for thermally treating substrates. A substrate is heated by a heating plate to improve thermal homogeneity. The heating plate is heated using a number of separately controlled heating elements. The temperature of the heating elements is measured and the heating process is controlled by a PID controller. In addition, the temperature of the substrate surface facing away from the heating plate is locally measured. The temperature distribution over the substrate surface is determined according to the measured temperatures and set values for the temperature of the individual heating elements are determined and transmitted to the PID controller.

Apparatus and method for the treatment of substrates

Low concentrations of substances dissolved in liquids are detected by coupling analysis/excitation light into the liquid core of an optical waveguide in the form of a capillary. When the substance of interest is to be excited to cause the emission of fluorescent light, the excitation light is transversely coupled into the hollow core of the waveguide and the generated fluorescent light is kept in the optical path of the waveguide for as long as possible. The invention also contemplates the use, in either an absorption or fluorescence mode, of specially treated fused silica fibers to deliver analysis/excitation light with very short wavelengths into the liquid core of an optical waveguide.

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Sternenfels, Germany

Peter Dress