Imec Vzw

Peter DeWolf

Wilfried B Vandervorst

Trudo Clarysse

A database method and method of using the database for determining the carrier concentration profile of a semiconductor, wherein the database includes a first set of first data, the first data being a correction factor; and a second set of second data, each of the second data including first and a second set of parameters, the first set of parameters characterizing the carrier concentration profile and the second set of parameters characterizing the measurement technique. Each data of the first set of first data is obtained from one data of the second set of data through simulation or calculation.

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Eeklo, Belgium

Peter DeWolf