Robert Boschgmbh

Peter Degenfeld-Schonburg

Reinhard Neul

Nils Felix Kuhlmann

Niels Bode

Burkhard Kuhlmann

Matthias Kuehnel

Andreas Lassl

Jan-Timo Liewald

Odd-Axel Pruetz

Andreas Lassi

Frank Schatz

Fabian Utermoehlen

Stefan Leidich

Tino Fuchs

Michael Curcic

Robert Roelver

Janine Riedrich-Moeller

Andreas Brenneis

A method for determining a rotational orientation change using an NMR gyroscope includes making use of a measure of determining, in a vapor cell, which is filled at least with a gaseous first element and a gaseous second element having non-vanishing nuclear spin, a nuclear spin component of the second element in the second direction and a nuclear spin component of the second element in a third direction. The second direction and the third direction are perpendicular to a first direction, which corresponds to the direction of the static magnetic field and to the polarization direction of the nuclear spin of the second element. Moreover, the second direction corresponds to the direction of an applied alternating magnetic field, the frequency of which corresponds to the Larmor frequency of the Larmor precession of the nuclear spin of the second element about the static magnetic field.

Method for determining a change in a rotational orientation in the space of an NMR gyroscope, and NMR gyroscope

A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Micromechanical rate-of-rotation sensor set-up, rate-of-rotation sensor array and corresponding manufacturing method

A method for providing a detection-signal for objects to be detected&#x2014;at least a first and second light-beam including different frequencies being generated with a first optical non-linear 3-wave-process from a light-beam of a light-source including an output-frequency, and the first light-beam including a reference-frequency being detected, and the second light-beam including an object-frequency being emitted and received after reflection on an object, and the light-beam including the output-frequency and the second light-beam including the object-frequency being superposed, and a reference-beam including a reference-frequency being generated with a second optical non-linear 3-wave-process from the two superposed light-beams including the output-frequency and including the object-frequency, and a detection-signal being generated so that the object-distance is determinable due to the aforementioned superposition based on the time-difference between the detection of the first light-beam including the reference-frequency and a detection of a change of the reference-beam including the reference-frequency.

Method for providing a detection signal for objects to be detected

A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater extension in the first main-extension-direction than in the second main-extension-direction.

Rotation-rate sensor, method for producing a rotation-rate sensor

A yaw-rate sensor with a substrate having a main extension plane. The yaw-rate sensor includes a rotation-element assembly, the rotation-element assembly being designed for detecting yaw rates prevailing in a first main extension axis of the substrate and yaw rates prevailing in a second main extension axis of the substrate perpendicular to the first main extension axis. The yaw-rate sensor has a sensor assembly, the sensor assembly being designed for detecting a yaw rate prevailing perpendicular to the main extension plane of the substrate, both the sensor assembly and the rotation-element assembly being drivable with the aid of a drive assembly, the drive assembly being designed for driving movement along the first main extension axis.

Yaw-rate sensor with a substrate having a main extension plane, method for manufacturing a yaw-rate sensor

A MEMS device and a corresponding operating method. The MEMS device is equipped with an oscillatory micromechanical system, which is excitable in a plurality of useful modes, the oscillatory micromechanical system including at least one system component, which is excitable in at least one parasitic spurious mode by a superposition of the useful modes. An adjusting device is provided, which is configured in such a way that it counteracts the parasitic spurious mode by application of an electromagnetic interaction to the system component.

MEMS device including spurious mode suppression and corresponding operating method

A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Three-axis micromechanical rotation rate sensor system including linearly and rotatorily drivable sensor units

A sensor includes a substrate having a first electrode arrangement; a first mass oscillator having (a) a first mass, (b) a first mass centroid, and (c) a second electrode arrangement including a first area centroid coinciding with the first mass centroid; and a second mass oscillator having (a) a second mass equal to the first mass, (b) a second mass centroid coinciding with the first mass centroid, and (c) a third electrode arrangement including a second area centroid coinciding with the first area centroid. Areas of the second and third electrode arrangements are equal. The sensor detects respective rotation rates around axes parallel to and perpendicular to a substrate extension. The oscillators are oscillatorily connected to each other and to the substrate, are deflectable, and experience respective forces in the directions of extension of the axes upon respective rotations around the other of the axes.

One-axis and two-axis rotation rate sensor

A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

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Renningen, Germany

Peter Degenfeld-Schonburg