Asml Netherlands B.v.

Peter Danny Van Voorst

Sietse Thijmen Van Der Post

Ferry Zijp

Sander Bas Roobol

Duygu Akbulut

Simon Gijsbert Josephus Mathijssen

Nan Lin

Koos Van Berkel

Jeroen Johan Maarten Van De Wijdeven

Teunis Willem Tukker

Han-Kwang Nienhuys

Sarathi Roy

Petrus Wilhelmus Smorenburg

Jacobus Maria Antonius Van Den Eerenbeemd

Gerrit Jacobus Hendrik Brussaard

Teis Johan Coenen

Nitish Kumar

Niels Geypen

Stefan Michael Bruno Bäumer

Adrianus Johannes Hendrikus Schellekens

Willem Maria Julia Marcel Coene

Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.

Wavefront sensor and associated metrology apparatus

An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

Method and apparatus for deriving corrections, method and apparatus for determining a property of a structure, device manufacturing method

There is described an optical system () for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system () and a second reflector system (). Each of the first and second reflector systems () comprises a finite-to-finite Wolter reflector system. The optical system () is configured to form, on the region of interest, a demagnified image () of an object () comprising an apparent source of the beam of radiation (B).

Optical system, metrology apparatus and associated method

An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

Optical systems, metrology apparatus and associated method

A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.

Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate

Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

Illumination source for an inspection apparatus, inspection apparatus and inspection method

Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

Method and apparatus for inspection and metrology

A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

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Nijmegen, Netherlands

Peter Danny Van Voorst