Gte Laboratories Incorporated

Gte Communications Products Corporation

Peter Cukor

Kang I Lee

Michael F Rubner

Kurt B Kilichowski

William Jensen

Charles Brecher

Robert C McDonald

Wei-Tao Wang

A negative working resist composition and medium for microlithographic recording comprises a vinyl polymer having aromatic quaternized nitrogen-containing pendant groups. The resist undergoes a transformation from high to low solubility in polar solvents such as water or low molecular weight alcohols upon exposure to electron beams, ultraviolet light, or X-rays. A method for patterning substrates by employing the resist composition is also disclosed.

High resolution lithographic resist and method

A primary electrochemical cell having an oxidizable active anode material, a cathode current collector, and an electrolytic solution comprising a liquid cathode material and an electrolyte solute dissolved therein. The cathode current collector includes a polymer selected from the group consisting of polyenes, polyphenylenes, polyheterocyclics, mixtures thereof, copolymers thereof, and cross linked polymers thereof.

Electrochemical cell

A method for selectively plating metal, such as copper, onto poly(phenylene sulfide) substrates is disclosed. In this method, a crystalline region and an amorphous region are created in a substrate. One method for creating these regions is to selectively crystallize a region in an amorphous poly(phenylene sulfide) substrate by heating it above its glass transition temperature. The surface of the substrate is then activated with an electroless plating catalyst such as palladium metal. After activation, a nitrosyl salt is introduced into the amorphous region of the substrate. The substrate is then immersed in an electroless plating solution containing the metal ions whereby metal selectively plates onto the crystalline region of the substrate.

Selective metal plating onto poly(phenylene sulfide) substrates

High resolution lithographic resist of negative working cationic vinyl

To accelerate printing of resist materials on a CRT color panel, an additive is incorporated into the resist to enhance cross-linking upon exposure to actinic radiation.

Photoresist of polyvinyl alcohol and ferric dichromate

Highly soluble bismuth salts of organic alkanoic acids are prepared by reacting an organic triaryl bismuth compound with an alkanoic acid in an inert organic solvent, and, after essential completion of the reaction, removing the inert organic solvent to afford the desired bismuth salt.

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Natick, MA, United States of America

Peter Cukor