Globalfoundries U.S. Inc.

Peter Coutu

Alain F Loiseau

Romain Feuillette

Structures for an integrated circuit having a watermark and related methods. The structure comprises a first semiconductor structure including at least one feature with a variation relative to a second semiconductor structure including the at least one feature without the variation. The variation provides a watermark for identifying a Process Design Kit used to form the first semiconductor structure.

Growing community of inventors

Williston, VT, United States of America

Peter Coutu