Basf Se Corporation

Per Magnus Kristiansen

Hans-Werner Schmidt

Sai Ping Shum

Martin Brunner

Michèle Gerster

Bruno Rotzinger

Matthew E Gande

Klaus H Stoll

Andrew J Leggio

Nils Mohmeyer

Hui Chin

Daniel Müller

Anthony David Debellis

Rolf Benz

The present invention provides a composition comprising (i) a polymer, (ii) an organic compound A carrying at least two amide functionalities, and (iii) 12 to 1'000 parts per million (ppm) of a compound B selected from the group consisting of an organic compound C carrying at least two amide functionalities, sugar alcohol acetals and derivatives thereof, metal salts of organic acids and precursor-systems thereof, metal salts of organic phosphoric acids and precursor-systems thereof and metal salts of polyols and precursor-systems thereof, and mixtures thereof, based on the weight of the polymer, as well as shaped articles obtainable from this composition.

Polymer compositions of improved scratch resistance, improved mechanical stability and improved haze

The present invention relates to methods of improving the scratch resistance of plastics materials and products made from them, such as articles in the automotive industry e.g. for the interior of automobiles, as well as the use of certain additives for that purpose and related invention embodiments. The improving comprises adding a friction modifier, and in addition a grafted polymer and a fatty acid amide, to a rubber modified polyolefin composition used as polymer substrate for the articles.

Method of improving scratch resistance and related products and uses

Disclosed are electret materials with outstanding thermal and charge stability. The electret materials comprise a melt blend of a thermoplastic polymer and one or more compounds selected from the aromatic trisamides. The aromatic trisamides are for example of the formula The melt blends are subjected to an electret treatment, for example a corona treatment. The electret materials are for example nonwoven polyolefin webs and are employed as filter materials, wipes, absorbent materials, filter masks, acoustic materials, printing substrates, measuring devices or contactless switches. The present electret materials may also comprise a further additive selected from the hindered amine light stabilizers and the hydroxyphenylalkylphosphonic esters or monoesters.

Electret materials

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Zurich, Switzerland

Per Magnus Kristiansen