Asml Netherlands B.v.

Pepijn Van Den Eijnden

Cornelius Maria Rops

Nicolaas Ten Kate

Rogier Hendrikus Magdalena Cortie

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Gheorghe Tanasa

Koen Cuypers

Mark Johannes Hermanus Frencken

Harold Sebastiaan Buddenberg

Evert Van Vliet

Marcel Maria Cornelius Franciscus Teunissen

Floor Lodewijk Keukens

Jantien Laura Van Erve

Ronald Van Der Ham

Gerben Pieterse

Ruud Olieslagers

Hubert Marie Segers

Jozef Augustinus Maria Alberti

Aart Adrianus Van Beuzekom

Francis Fahrni

Paul Van Dongen

Bas Willems

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

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Eindhoven, Netherlands

Pepijn Van Den Eijnden