Rohm & Haas Electronic Materials LLC

Rohm and Haas Electronic Materials Korea Ltd.

Peng-Wei Chuang

Deyan Wang

Christopher D Gilmore

Young Seok Kim

Yerang Kang

Peter Trefonas, Iii

Kathleen M O'Connell

Cong Liu

Tae Hwan Kim

Jieqian Zhang

Jibin Sun

Lujia Bu

Ping Ding

Herong Lei

Young-Seok Kim

Moo-Young Lee

Certain polyarylene oligomers having improved solubility are useful in forming dielectric material layers in electronics applications.

Polyarylene materials

Compositions of arylene oligomers and certain curing agents are useful to provide arylene polymer coatings having improved mechanical properties when cured in an oxygen-containing atmosphere. Methods of curing such compositions are also provided.

Polyarylene polymers

A method of manufacturing a display device is provided which uses a sacrificial layer interposed between a carrier and a display device substrate.

Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate

Methods of treating the surface of a metal-containing hardmask used in the manufacture of semiconductors by contacting the hardmask surface with a composition capable of adjusting the water contact angle so as to substantially match that of subsequently applied organic coatings are provided.

Hardmask surface treatment

Compositions containing certain organometallic oligomers suitable for use as spin-on, metal hardmasks are provided, where such compositions can be tailored to provide a metal oxide hardmask having a range of etch selectivity. Also provided are methods of depositing metal oxide hardmasks using the present compositions.

Hardmask

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Natick, MA, United States of America

Peng-Wei Chuang