Trumpf Huettinger Sp. Z O. O.

Ozimek, Pawel

Klimczak, Andrzej

Golan, Marcin

Zelechowski, Marcin

Huettinger Electronic Sp. Z O. O

Pawel Ozimek

Andrzej Klimczak

Rafal Bugyi

Marcin Zelechowski

Robert Dziuba

Marcin Golan

Jakub Swiatnicki

Krzysztof Ruda

Jan Peter Engelstaedter

A balun configured for a power range between 500 W and 5 kW output includes a balanced signal port comprising a first connection and a second connection and further includes a single-ended signal port comprising a third connection and a fourth connection, the fourth connection being connected to ground. In addition, the balun includes a first capacitor disposed between the first connection and a first end of a first resistor and a second capacitor disposed between the second connection and the first end of the first resistor. A second end of the first resistor is connected to ground.

Balun and amplifier including balun

A power converter is capable to convert an electrical input power into a bipolar output power and to deliver the bipolar output power to at least two independent plasma processing chambers. The power converter includes: a power input port for connection to an electrical power delivering grid, at least two, preferably more than two, power output ports each for connection to one of the plasma process chambers, and a controller configured to control the power converter to deliver the bipolar output power to the power output ports, using one or more control parameters selected from a list comprising: power, voltage, current, excitation frequency, and threshold for protective measures, such that at least one of the control parameters at a first power output port is different from the corresponding control parameter at a different power output port.

Controlling multiple plasma processes

A method of generating a highly ionized plasma in a plasma chamber. A neutral gas is provided to be ionized in the plasma chamber at pressure below 50 Pa. At least one high energy high power electrical pulse is supplied with power equal or larger than 100 kW and energy equal or larger than 10 J, to at least one magnetron cathode in connection with a target in the plasma chamber. A highly ionized plasma is produced directly from the neutral gas in a plasma volume such that the plasma volume cross section increases during a current rise period. Atoms are sputtered from the target with the highly ionized plasma. At least part of the sputtered atoms are ionized.

Generating a highly ionized plasma in a plasma chamber

According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.

Reducing stored electrical energy in a lead inductance

An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling RF power from the inductance into a plasma chamber.

Apparatus for generating and maintaining plasma for plasma processing

The current (I) flowing between a plasma chamber and a power supply is limited by limiting the current change di/dt if the current exceeds a predetermined current. A current change limiting device is provided in the current path between the power supply and the plasma chamber and is configured to determine if the current exceeds the predetermined current and limits the current change.

Growing community of inventors

Warsaw, Poland

Pawel Ozimek