Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh

Applied Materials Israel Limited

Applied Materials, Inc.

Ict Integrated Circuit Testing Gesellschaft F&uuml;r Halbleiterpr&uuml;ftechnik Mbh

Ict Integrated Circuit Testing Gesellschaft

Pavel Adamec

Dieter Winkler

Hans-Peter Feuerbaum

Igor Petrov

Ivo Liska

Harry Munack

Jürgen Frosien

Helmut Banzhof

Ralf Degenhardt

Zvika Rosenberg

Fang Zhou

Gilad Almogy

Juergen Frosien

Dror Shemesh

Carlo Salvesen

Avishai Bartov

Asher Pearl

Igor Krivts

Alex Goldenshtein

Radel Ben-Av

Nadav Haas

Yaron I Gold

Shemesh Dror

Harry Kleinschmidt

Uli Hoffmann

Jimmy Vishnipolsky

Gennadij Gluchman

Achim Göhl

Milan Snabl

Igor Krayvitz

A charged particle beam apparatus () is described. The charged particle beam apparatus includes a first vacuum region () in which a charged particle beam emitter () for emitting a charged particle beam () along an optical axis (A) is arranged, a second vacuum region () downstream of the first vacuum region and separated from the first vacuum region by a first gas separation wall () with a first differential pumping aperture (), wherein the first differential pumping aperture () is configured as a first beam limiting aperture for the charged particle beam (); and a third vacuum region () downstream of the second vacuum region and separated from the second vacuum region by a second gas separation wall () with a second differential pumping aperture (), wherein the second differential pumping aperture () is configured as a second beam limiting aperture for the charged particle beam (). Further described are a scanning electron microscope and a method of operating a charged particle beam apparatus.

Charged particle beam apparatus, scanning electron microscope, and method of operating a charged particle beam apparatus

A charged particle beam arrangement is described. The charged particle beam arrangement includes a charged particle source including a cold field emitter, a beam limiting aperture between the charged particle source and a magnetic condenser lens; the magnetic condenser lens comprising a first inner pole piece and a first outer pole piece, wherein a first axial distance between the charged particle source and the first inner pole piece is equal or less than approximately 20 mm, an acceleration section for accelerating the charged particle beam to an energy of 10 keV or more, a magnetic objective lens comprising a second inner pole piece and a second outer pole piece, a third axial distance between the second inner pole piece and a surface of a specimen is equal to or less than approximately 20 mm, and a deceleration section.

High performance inspection scanning electron microscope device and method of operating the same

The present disclosure provides an electron beam device () for inspecting a sample () with an electron beam, comprising an electron beam source comprising a cold field emitter () for emitting an electron beam, electron beam optics for directing and focusing the electron beam onto the sample (), and a detector device () for detecting secondary charged particles generated by impingement of the electron beam on the sample (). The cold field emitter () includes an emitter tip (), a base arrangement () configured for supporting the emitter tip () and comprising a first base element () and a second base element (), and a filament () having at least a first filament portion () and a second filament portion () attaching the emitter tip () to the base arrangement (), wherein the first filament portion () extends between the emitter tip () and the first base element () and the second filament portion () extends between the emitter tip () and the second base element (), wherein a length (L) of each of the first filament portion () and the second filament portion () is 4 mm or less, and wherein a diameter of a cross-section of each of the first filament portion () and the second filament portion () is 0.13 mm or less.

Electron beam device, cold field emitter, and method for regeneration of a cold field emitter

A housing device for providing a magnetic shielding of a charged particle beam is described. The housing device includes a housing element configured to at least partially enclose a charged particle beam propagation path and comprising a magnetic shielding material, wherein the housing element includes an inner surface directed toward the charged particle beam propagation path, an outer surface directed away from the charged particle beam propagation path and at least one edge region with an edge surface connecting the inner surface with the outer surface; and a contacting element comprising a conductive material and fixed to the at least one edge region in at least one of a form-fit connection and a bonded connection. Further, a housing arrangement including two or more electrically contacting housing devices, a charged particle beam device with a housing device, and methods of manufacturing a housing device are described.

Housing device for magnetic shielding, housing arrangement for magnetic shielding, charged particle beam device, and method of manufacturing a housing device

A cold field emitter for emitting an electron beam for an electron beam device is described. The emitter includes an emitter tip having a tip surface; and two or more adjacent facets formed at the tip surface and having facet boundaries, each of the facets forming a recess in the emitter tip, wherein the facets are separated. An intermediate area is provided between and around the two or more adjacent facets and the intermediate area is configured for electron emission. Further, an electron beam device, a method for operating an electron beam device and a method for producing an emitter for an electron beam device is described.

Emitter for an electron beam, electron beam device and method for producing and operating an electron emitter

A multi-beam scanning electron beam device () is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter () for emitting a plurality of electron beams (), at least one common electron beam optical element () having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element () for individually influencing the plurality of electron beams, a common objective lens assembly () for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen () for generation of a plurality of signal beams (), and a detection assembly () for individually detecting each signal beam on a corresponding detection element.

Multi-beam scanning electron beam device and methods of using the same

A charged particle beam source device adapted for generating a charged particle beam is provided. The charged particle beam source device includes an emitter tip adapted for providing charged particles. Furthermore, an extractor electrode having an aperture opening is provided for extracting the charged particles from the emitter tip. An aperture angle of the charged particle beam is 2 degrees or below the aperture angle being defined by a width of the aperture opening and a distance between the emitter tip and the extractor electrode, wherein the distance between the emitter tip and the extractor electrode is a range from 0.1 mm to 2 mm.

High brightness electron gun, system using the same, and method of operating thereof

A gun arrangement configured for generating a primary electron beam for a wafer imaging system is described. The arrangement includes a controller configured for switching between a normal operation and a cleaning operation, a field emitter having an emitter tip adapted for providing electrons and emitting an electron beam along an optical axis, an extractor electrode adapted for extracting the electron beam from the emitter tip electrode, a suppressor electrode, and at least one auxiliary emitter electrode arranged radially outside the suppressor electrode, and provided as a thermal electron emitter for thermally emitting electrons towards the optical axis.

Electron gun arrangement

A method of pre-treating an ultra high vacuum charged particle gun chamber by ion stimulated desorption is provided. The method includes generating a plasma for providing a plasma ion source, and applying a negative potential to at least one surface in the gun chamber, wherein the negative potential is adapted for extracting an ion flux from the plasma ion source to the at least one surface for desorbing contamination particles from the at least one surface by the ion flux impinging on the at least one surface.

Method and apparatus of pretreatment of an electron gun chamber

A method and a device for stabilizing the emission current of an emitter of a charged particle beam device are provided. In the method, the emitter is operated under predetermined operation parameters including at least one voltage with a predetermined value. The method includes determining a first value of the emission current under the predetermined operation parameters and flash cleaning the emitter while a first electric field is applied to the emitter. The first electric field is generated by the at least one voltage having a first value of the at least one voltage, wherein the first value of the at least one voltage is provided in dependence of the determined first value of the emission current.

Feedback loop for emitter flashing

A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap, a particle optics configured for separating the signal beam in a first portion of the signal beam and in at least one second portion of the signal beam, configured for focusing the first portion of the signal beam, and configured for deflecting and focusing the at least one second portion of the signal beam, wherein the particle optics includes a first electrode and at least one second electrode. Therein, the first electrode is an inner electrode and the at least one second electrode is provided radially outward of the first electrode.

Multi channel detector, optics therefor and method of operating thereof

A charged particle beam device for inspecting a specimen includes a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; a retarding field device adapted to accelerate secondary charged particles starting from the specimen, a first detector device having a central opening, includes at least two azimuthal detector segments for detecting secondary particles, wherein the objective lens device is adapted such that particles with different starting angles from the specimen exhibit crossovers at substantially the same distance from the specimen between the objective lens and the detector device, and an aperture located between the objective lens and the crossovers, having an opening which is equal to or smaller than the central opening in the detector device.

Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen

It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.

A charged particle gun alignment assembly for emitting a charged particle beam along an optical axis of a charged particle beam device is described. The charged particle gun alignment assembly is configured to compensate for misalignment of the charged particle beam and includes a charged particle source having an emitter with a virtual source defining a virtual source plane substantially perpendicular to the optical axis; a condenser lens for imaging the virtual source; a final beam limiting aperture adapted for shaping the charged particle beam; and a double stage deflection assembly positioned between the condenser lens and the final beam limiting aperture, wherein the working distance of the condenser lens is 15 mm or less.

Method and device for improved alignment of a high brightness charged particle gun

A magnetic lens for a charged particle beam device and a charged particle beam device are provided. The magnetic lens includes a coil with coil windings to be excited for generation of a magnetic field, a pole piece to guide the magnetic field, a heat shield, which is connected to a cooling system, and a thermal insulation layer provided between the heat shield and the coil.

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Haar, Germany

Pavel Adamec