Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno

Paulus Willibrordus George Poodt

Freddy Roozeboom

Adrianus Johannes Petrus Maria Vermeer

Gerardus Johan Jozef Winands

Philippe Vereecken

Erwin John Van Zwet

Antonius Maria Bernardus Van Mol

Norbertus Benedictus Koster

Sandeep Unnikrishnan

Marcel Simor

Joop Van Deelen

Ariël De Graaf

Raymond Jacobus Wilhelmus Knaapen

Yves Lodewijk Maria Creyghton

Pieter Jan Bolt

Adriaan Marinus Lankhorst

Sebastien Paul Norbert Moitzheim

Andrea Illiberi

Frank Theodoor Johannes Grob

Ahmed Fawzy

A plasma source has an outer surface, interrupted by an aperture for delivering an atmospheric plasma from the outer surface. A transport mechanism transports a substrate in parallel with the outer surface, closely to the outer surface, so that gas from the atmospheric plasma may form a gas bearing between the outer surface the and the substrate. A first electrode of the plasma source has a first and second surface extending from an edge of the first electrode that runs along the aperture. The first surface defines the outer surface on a first side of the aperture. The distance between the first and second surface increasing with distance from the edge. A second electrode covered at least partly by a dielectric layer is provided with the dielectric layer facing the second surface of the first electrode, substantially in parallel with the second surface of the first electrode, leaving a plasma initiation space on said first side of the aperture, between the surface of the dielectric layer and the second surface of the first electrode. A gas inlet feeds into the plasma initiation space to provide gas flow from the gas inlet to the aperture through the plasma initiation space. Atmospheric plasma initiated in the plasma initiation space flows to the aperture, from which it leaves to react with the surface of the substrate.

Plasma source and surface treatment method

An electrode for a Lithium battery, comprising: a multi-dyad nanolaminate stack formed of a metal oxide layer of the group TiO2, MnO2 or combinations thereof, ranging between 0.3 and 300 nm; separated by a decoupling layer.

Hybrid nanolaminate electrodes for Li-ion batteries

A method of depositing an atomic layer on a substrate comprises supplying a precursor gas from a precursor-gas supply comprised in a drum; the drum being rotatable with respect to a sealing piece that receives gas from a gas source. One of the drum or sealing piece comprising one or more gas feed channels in fluid connection with the precursor-gas supply and the other of the drum or sealing piece comprises one or more circumferential grooves in its surface sealed by the one of the drum or sealing piece thereby preventing a fluid flowpath in radial direction and leaving a fluid flow path in circumferential direction. At least one sealed groove is provided with one or more separations separating adjacent zones of process gas feeds in the sealed groove, thus allowing zones to provide for mutually differing process gas compositions to have the precursor gas react near, e.g. on, the substrate thus depositing a stack of atomic layers of a gradient composition.

Method and apparatus for depositing atomic layers on a substrate

The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the surface of the substrate; a passivation zone including a cavity provided with a passivation gas supply; said supply arranged for providing a passivation gas flow from the supply to the cavity; the cavity in use being bounded by the injector head and the substrate surface; and a gas purge structure comprising a gas exhaust arranged between said etch zone and passivation zone; the gas purge structure thus forming a spatial division of the etch and passivation zones.

Apparatus and method for reactive ion etching

A method of manufacturing a substrate with a patterned layer of deposited material, the patterned layer being deposited from a processing head, the method comprising

Continuous patterned layer deposition

The present invention relates to a method for enhancing the conductivity of an undoped transparent metal oxide to obtain a transparent conductive oxide (TCO) electrode. More in particular it relates to such a method comprising the steps of providing a transparent metal oxide, applying a UV transparent barrier layer on the transparent metal oxide, and irradiating the transparent metal oxide with UV radiation after applying the barrier layer.

Method of making a transparent metal oxide electrode

The invention relates to a method for treating a metal oxide layer deposited on a substrate. The method comprises the step of applying a substantially atmospheric plasma process at a relatively low temperature. Preferably, the temperature during the plasma process is lower than approximately 180&#xb0; C. Further, the atmospheric plasma process can be applied in a plasma chamber comprising Hgas and He gas.

Method for treating a metal oxide layer

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's-Gravenhage, Netherlands

Paulus Willibrordus George Poodt