Asml Netherlands B.v.

Universiteit Twente

Paulus Wilhelmus Leonardus Van Dijk

Cheng-Qun Gui

Rudy Jan Maria Pellens

Erwin Rinaldo Meinders

Peter Theodorus Maria Giesen

Johannes Wilhelmus Eikenbroek

Paul Klatser

Chris Gerardus Hermanus Roeloffzen

Wilhelmus Johannes Maria De Laat

Geoffrey Norman Phillipps

Willem Paul Beeker

Budiman Sutedja

Leimeng Zhuang

Johannes Paulus Adrianus Maria Van Den Heuvel

A phased-array antenna that includes a photonic beamformer is disclosed. In some embodiments, a front stage of electrical-domain processing applies a 16-to-1 signal-combination ratio, a single stage of photonic beamforming applies a 4-to-1 signal-combination ratio, and a passive, electrical-domain, signal combiner applies a 32-to-1 signal-combination ratio.

Electronically-steered Ku-band phased array antenna comprising an integrated photonic beamformer

A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.

Lithographic method and carrier substrate

A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target portions of a substrate such that the projected image portions are substantially adjacent to each other on the substrate and collectively form a composite image on the substrate. The method also includes projecting a metrology mark onto the substrate outside of the area of the composite image at the same time as projecting each of at least two of the image portions, and measuring the alignment of the metrology marks to determine the relative positions of the at least two image portions.

Lithographic method and patterning device

According to an aspect of the present invention, there is provided a lithographic apparatus that includes a substrate carrier arranged to hold a substrate in position using an electrostatic force. The substrate carrier is provided with an integral power source. The apparatus also includes a substrate table for holding the substrate carrier.

Lithographic apparatus and method

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Tilburg, Netherlands

Paulus Wilhelmus Leonardus Van Dijk