Asml Netherlands B.v.

Paulus Martinus Hubertus Vissers

Jan-Gerard Cornelis Van Der Toorn

Jeroen Johannes Sophia Maria Mertens

Teunis Cornelis Van Den Dool

Eva Mondt

Frank B Sperling

Suzan Leonie Auer-Jongepier

Alexander Nikolov Zdravkov

The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.

Stage apparatus

A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.

Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table

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Nederweert, Netherlands

Paulus Martinus Hubertus Vissers