Asml Netherlands B.v.

Asml Holding N.v.

Paul William Scholtes-Van Eijk

Patrick Sebastian Uebel

Sebastian Thomas Bauerschmidt

Ronald Franciscus Herman Hugers

Peter Maximilian Götz

Paulus Antonius Andreas Teunissen

Andreas Johannes Antonius Brouns

Vitaliy Prosyentsov

Edwin Johannes Cornelis Bos

Mahesh Upendra Ajgaonkar

Jan Adrianus Boer

Roelof Frederik De Graaf

Franciscus Johannes Joseph Janssen

Ronald Van Der Ham

Paulus Martinus Maria Liebregts

Koen Steffens

Wilhelmus Franciscus Johannes Simons

Marcio Alexandre Cano Miranda

Han Henricus Aldegonda Lempens

Daniel Jozef Maria Direcks

Paul Petrus Joannes Berkvens

Gert-Jan Gerardus Johannes Thomas Brands

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Mathieus Anna Karel Van Lierop

Joris Johan Anne-Marie Verstraete

A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.

Mode control of photonic crystal fiber based broadband radiation sources

An apparatus for receiving input radiation and broadening a frequency range of the input radiation to provide broadband output radiation. The apparatus includes a chamber, a fiber, a gas generating apparatus, and a radical generating apparatus. The fiber includes a hollow core configured to guide radiation propagating through the fiber, the hollow core in fluid communication with the chamber. The gas generating apparatus is configured to provide a gas within the chamber. The radical generating apparatus is configured to provide free radicals within the chamber to reduce contaminants in the gas. The apparatus may be included in a radiation source.

Frequency broadening apparatus and method

Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.

Metrology apparatus with radiation source having multiple broadband outputs

An apparatus () for receiving input radiation () and broadening a frequency range of the input radiation so as to provide broadband output radiation (). The apparatus comprises a fiber (), wherein the fiber () may comprise a hollow core () for guiding radiation propagating through the fiber (). The apparatus () further comprises an apparatus for providing a gas mixture () within the hollow core (). The gas mixture () comprises a hydrogen component, and a working component, wherein the working component is for broadening a frequency range of a received input radiation () so as to provide the broadband output radiation (). The apparatus may be included in a radiation source.

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

Lithographic apparatus and device manufacturing method

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Veldhoven, Netherlands

Paul William Scholtes-Van Eijk