Ciba-geigy Corporation

Paul Wenk

Alfred Sallmann

Andreas Beck

Marcus Baumann

Werner Breitenstein

Robert W Lang

4-Acylresorcinol ethers of the formula ##STR1## in which R.sub.1 is lower alkyl, R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is uninterrupted or interrupted by oxygen, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 which differs from this is a radical R.sub.9 and a radical R.sub.7 which differs from this is a radical R.sub.10, R.sub.6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esterified or amidated, cyano or lower alkanoyl, R.sub.8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R.sub.9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R.sub.10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties.

Novel fluorinated resorcinol ethers and their use as anti-allergics and

Novel 4-acylresorcinol ethers of the formula ##STR1## in which R.sub.1 represents lower alkyl, R.sub.2 represents lower alkyl, lower alkenyl or lower alkynyl, R.sub.3 represents hydrogen, lower alkoxy, trifluoromethyl or halogen, alk represents an alkylene radical, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 that is other than a group of the formula --NH--C(.dbd.0)--R.sub.8 is a radical R.sub.9 and a radical R.sub.7 that is other than a group of the formula --NH--C(.dbd.0)--R.sub.8 is a radical R.sub.10, R.sub.6 represents hydrogen, lower alkyl, halogen, trifluoromethyl, optionally esterified or amidated carboxy, cyano or lower alkanoyl, R.sub.8 represents optionally esterified or amidated carboxy, or 5-tetrazolyl, R.sub.9 represents hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl, and R.sub.10 represents hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or optionally esterified or amidated carboxy, and their salts have LTD.sub.4 -antagonistic and PLA.sub.2 -phospholipase-inhibiting properties. They can be manufactured according to methods known per se.

Novel resorcinol ethers and anti-inflammatory and anti-allergic use

4-Acylresorcinol esthers of the formula ##STR1## in which R.sub.1 is lower alkyl, R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is uninterrupted or interrupted by oxygen, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 which differs from this is a radical R.sub.9 and a radical R.sub.7 which differs from this is a radical R.sub.10, R.sub.6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esterified or amidated, cyano or lower alkanoyl, R.sub.8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R.sub.9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R.sub.10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties. They are prepared, for example, by reacting compounds of the formulae ##STR2## in which one of the radicals X.sub.5 and X.sub.6 is hydroxyl which is free or in salt form and the other is an alkoxy radical substituted by reactive esterified hydroxy or epoxy. The invention also relates to intermediates of the formula ##STR3## in which R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen and R.sub.11 is hydrogen or a group of the formula R.sub.1 --C(--O)--, in which R.sub.1 is lower alkyl, and their salts.

Oxaloamino substituted fluorinated resorcinol ethers and anti-allergic

Novel 4-acylresorcinol ethers of the formula ##STR1## in which R.sub.1 is lower alkyl, alk is a hydroxyalkylene radical which can be interrupted by oxygen and R.sub.2 is 5-tetrazolyl, it being possible for the ring A to be additionally substituted by a lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy and/or halogen and for the ring B to be additionally substituted by lower alkyl, lower alkanoyl, lower alkoxy, lower alkoxycarbonyl, carboxyl, cyano, carbamyl, halogen and/or trifluoromethyl, and salts thereof have antiallergic properties and can be used as active compounds for medicaments. They are prepared by methods known as per se.

N-(substituted phenyl) tetrazol-5-yl carboxamides and anti-allergic use

4-Acylresorcinol ethers of the formula ##STR1## in which R.sub.1 is lower alkyl, R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is uninterrupted or interrupted by oxygen, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 which differs from this is a radical R.sub.9 and a radical R.sub.7 which differs from this is a radical R.sub.10, R.sub.6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esterified or amidated, cyano or lower alkanoyl, R.sub.8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R.sub.9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R.sub.10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties. They are prepared, for example, by reacting compounds of the formulae ##STR2## in which one of the radicals X.sub.5 and X.sub.6 is hydroxyl which is free or in salt form and the other is an alkoxy radical substituted by reactive esterified hydroxyl or epoxy. The invention also relates to intermediates of the formula ##STR3## in which R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen and R.sub.11 is hydrogen or a group of the formula R.sub.1 --O(.dbd.O)--, in which R.sub.1 is lower alkyl, and their salts.

Novel fluorinated resorcinol ethers

Benzofurans or 2,3-dihydrobenzofurans of the formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical,

Heterocyclicamino containing benzofurans and 2,3-dihydrobenzofurans,

The invention relates to novel lactones, especially benzofuranones of the general formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical, R.sub.2 represents an amino group di-substituted by two monovalent hydrocarbon radicals, and the aromatic ring A may be additionally substituted, and their salts and/or isomers, processes for the manufacture of compounds of the formula (I) and their salts and isomers, pharmaceutical preparations containing these compounds, and their use as the active ingredients of medicaments and/or for the manufacture of pharmaceutical preparations.

Benzofuran-2(3H)-ones used as anti-inflammatory agents

The invention relates to novel furans, especially benzofuranones of the general formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical, R.sub.2 represents an amino group di-substituted by a divalent hydrocarbon radical, and the aromatic ring A may be additionally substituted, and their salts and/or isomers, processes for the manufacture of compounds of the formula (I) and their salts and isomers, pharmaceutical preparations containing these compounds, and their use as the active ingredients of anti-inflammatory agents or analgesics and/or for the manufacture of pharmaceutical preparations.

Method of treating inflammation and pain using heteramino benzofurans

The invention relates to novel furans, especially benzofuranones of the general formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical, R.sub.2 represents an amino group di-substituted by a divalent hydrocarbon radical, and the aromatic ring A may be additionally substituted, and their salts and/or isomers, processes for the manufacture of compounds of the formula (I) and their salts and isomers, pharmaceutical preparations containing these compounds, and their use as the active ingredients of medicaments as anti-inflammatory agents, analgesics or light-screening agents and/or for the manufacture of pharmaceutical preparations.

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Allschwil, Switzerland

Paul Wenk