Asml Netherlands B.v.

Paul Van Dongen

Aart Adrianus Van Beuzekom

Cornelius Maria Rops

Ronald Van Der Ham

Gerben Pieterse

Ruud Olieslagers

Hubert Marie Segers

Jozef Augustinus Maria Alberti

Pepijn Van Den Eijnden

Francis Fahrni

Bas Willems

Martinus Hendrikus Antonius Leenders

Martijn Houben

Mircea Dusa

Thomas Poiesz

Abraham Alexander Soethoudt

Antonie Hendrik Verweij

Justin Johannes Hermanus Gerritzen

Marco Adrianus Peter Van Den Heuvel

Niek Elout De Kruijf

Johannes Gerardus Maria Mulder

A lithographic apparatus comprising a substrate storage module having a controllable environment for protecting lithographically exposed substrates from ambient air. The substrate storage module is configured to store at least twenty substrates and the substrate storage module is an integral part of the lithographic apparatus. The substrate storage module may be used to protect substrates from ambient air during stitched lithographic exposures.

Lithographic apparatus and method

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Paul Van Dongen