University of Houston System

Other

Paul Ruchhoeft

John Charles Wolfe

Demetre J Economou

Lin Xu

Vincent M Donnelly

Sri Charan Vemula

Manish Kumar Jain

Richard Coale Willson

Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly spaced pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.

Device and method for manufacturing a particulate filter with regularly spaced micropores

A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e.g., a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner.

System and method for nano-pantography

Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.

Method and apparatus for nano-pantography

Labels and methods of producing labels for use in clinical, analytical and pharmaceutical development assays are provided. Labels may comprise shape-encoded particles which may be coupled to ligands such as DNA, RNA and antibodies, where different shapes are used to identify which ligand(s) are present. Labels may also comprise reflectors, including retroreflectors and retroreflectors susceptible to analyte-dependent assembly for efficient homogeneous assays.

Optical microlabels: shapes and reflectors

An energetic neutral particle lithographic apparatus is disclosed for replicating sub-micron and nanoscale patterns including a source producing a beam of energetic neutral particles, comprising atoms or molecules, by charge transfer scattering of energetic ions from the molecules of a gas, a mask member having open stencil windows in a supporting membrane, an energetic neutral particle protective layer on the membrane, and a reproduction member consisting of an energetic neutral particle-sensitive layer between a substrate and the mask for absorbing energetic neutral particles in a pattern created by the mask.

Energetic neutral particle lithographic apparatus and process

For producing an exposure pattern on a curved, in particular concave substrate field of a substrate which comprises a layer of resist material sensitive to exposure to an energetic radiation, in a pattern transfer system a wide, substantially parallel beam of said energetic radiation is produced, and by means of said beam a planar mask having a structure pattern, namely, a set of transparent windows to form a structured beam, is illuminated and the structure pattern is imaged onto the substrate by means of the structured beam, producing a pattern image, namely, a spatial distribution of irradiation over the substrate. The direction of incidence of said beam onto the mask is varied through a sequence of inclinations with respect to the normal axis to the mask, the sequence of inclinations being adapted to merge those exposure pattern components which result from neighboring windows of the structure pattern, the exposure with respect to the sequence of inclinations superposing into a spatial distribution of exposure dose on the substrate, said distribution exceeding the specific minimum exposure dose of said resist material within only one or more regions of the substrate field, said region(s) forming the exposure pattern. The center of curvature of the substrate field is positioned to align with the pattern center on the mask. The windows of the structure pattern are arranged in a manner that along each radius from the pattern center, the radial spacing of said windows decreases with increasing radius from the pattern center; preferably, the windows have uniform area.

Lithographic patterning of curved substrates

For lithographic patterning a plurality of identical structures ( ) onto a target substrate ( ), a template mask ( ) is produced which bears a template structure pattern comprising a plurality of identical template structures each consisting of a set of at least one structure element (C) of circular shape. Starting from a primary mask ( ) bearing a primary structure pattern consisting of at least one structure element having a circular shape, the production of the template mask is done in at least one lithographic mask structuring step (b, c) wherein in each mask structuring step by means of a broad beam ( ) of energetic radiation the mask is illuminated and a structure pattern on the mask ( ) is imaged onto an intermediate substrate ( ); in these mask structuring steps the pattern image imaged from the structure pattern is moved over the intermediate substrate to a number of different locations. From the intermediate substrate ( ) thus patterned another mask ( ) having a structure pattern corresponding to the pattern image is produced, respectively. The mask produced from the last of said mask structuring steps is the template mask ( ). By means of the template mask ( ) a target substrate ( ) is patterned in a final lithographic patterning step, the pattern image thus produced comprising a plurality of identical target structures ( ).

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Houston, TX, United States of America

Paul Ruchhoeft