Asml Netherlands B.v.

Paul Petrus Joannes Berkvens

Christophe De Metsenaere

Koen Steffens

Wilhelmus Franciscus Johannes Simons

Daniel Jozef Maria Direcks

Michel Riepen

Paulus Martinus Maria Liebregts

Ronald Van Der Ham

Marcio Alexandre Cano Miranda

Han Henricus Aldegonda Lempens

Patrick Johannes Wilhelmus Spruytenburg

Joris Johan Anne-Marie Verstraete

Franciscus Johannes Joseph Janssen

Gert-Jan Gerardus Johannes Thomas Brands

Mathieus Anna Karel Van Lierop

Christiaan Alexander Hoogendam

Danny Maria Hubertus Philips

Jimmy Matheus Wilhelmus Van De Winkel

Eva Mondt

Maikel Adrianus Cornelis Schepers

Nicolaas Rudolf Kemper

Roelof Frederik De Graaf

Cornelius Maria Rops

Marcus Martinus Petrus Adrianus Vermeulen

Clemens Johannes Gerardus Van Den Dungen

Robertus Nicodemus Jacobus Van Ballegoij

Daniël Jozef Maria Direcks

Martinus Wilhelmus Van Den Heuvel

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Jeroen Johannes Sophia Maria Mertens

Johannes Henricus Wilhelmus Jacobs

Henrikus Herman Marie Cox

Marcel Beckers

Ruud Hendrikus Martinus Johannes Bloks

Pieter Mulder

Gregory Martin Mason Corcoran

Ronald Casper Kunst

Hrishikesh Patel

Paul William Scholtes-Van Eijk

Marcus Johannes Van Der Zanden

Matheus Anna Karel Van Lierop

David Lucien Anstotz

Mauritius Gerardus Elisabeth Schneiders

Arnold Jan Van Putten

Gert-Jan Geradus Johannes Thomas Brands

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Fluid extraction system, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

Immersion lithographic apparatus including a pressure sensor to measure pressure of the immersion liquid and a device manufacturing method

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

Fluid handling structure, lithographic apparatus and a device manufacturing method

A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

Methods relating to immersion lithography and an immersion lithographic apparatus

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.

A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.

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Veldhoven, Netherlands

Paul Petrus Joannes Berkvens