Lam Research Corporation

Paul Mulgrew

Hong Shih

Armen Avoyan

Tuochuan Huang

Robert G Anderson

John Edward Daugherty

Duane Outka

Brian K McMillin

Dean Jay Larson

Sivakami Ramanathan

Catherine Zhou

Yan Fang

Bruno Morel

Jeremy Chang

A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.

Method of cleaning aluminum plasma chamber parts

A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.

Wet cleaning of electrostatic chucks

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San Jose, CA, United States of America

Paul Mulgrew