Asml Netherlands B.v.

Asml Holding N.v.

Paul Janssen

Derk Servatius Gertruda Brouns

Pieter-Jan Van Zwol

Arnoud Willem Notenboom

Mária Péter

David Ferdinand Vles

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Matthias Kruizinga

Johannes Petrus Martinus Bernardus Vermeulen

Maxim Aleksandrovich Nasalevich

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Marcus Adrianus Van De Kerkhof

James Norman Wiley

Gerrit Van Den Bosch

Aleksandar Nikolov Zdravkov

Erik Achilles Abegg

Martinus Hendrikus Antonius Leenders

Dennis De Graaf

Erik Roelof Loopstra

Johan Hendrik Klootwijk

Frits Van Der Meulen

Richard Joseph Bruls

Robert Gabriël Maria Lansbergen

Jeroen Dekkers

Maarten Mathijs Marinus Jansen

Jérôme François Sylvain Virgile Van Loo

Jorge Manuel Azeredo Lima

Marc Bruijn

Ronald Harm Gunther Kramer

Pradeep Kumar Govil

Adrianus Johannes Maria Giesbers

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Robertus Cornelis Martinus De Kruif

Aage Bendiksen

Daniel Andrew Smith

Andrey Alexandrovich Nikipelov

Antonius Franciscus Johannes De Groot

Egbert Lenderink

Evgenia Kurganova

Hrishikesh Patel

Gijsbert Rispens

Angelo Cesar Peter De Klerk

Nadja Schuh

Silvester Matheus Reijnders

Michiel Alexander Blauw

Mohammad Reza Kamali

Nirupam Banerjee

Chaitanya Krishna Ande

Hendrikus Jan Wondergem

Antonius Willem Verburg

Peter Simon Antonius Knapen

Roland Jacobus Johannes Kerstens

Wouter Rogier Meijerink

Michel Loos

Raymond Olsman

Geert Middel

Frank Johannes Christiaan Theuerzeit

Anne Johannes Wilhelmus Van Lievenoogen

Nicolae Maxim

Claudia Piliego

Jan Hendrik Willem Kuntzel

Johannes Joseph Janssen

Jacobus Maria Dings

Marcel Peter Meijer

Maurice Leonardus Johannes Janssen

Stephen Roux

Matthew Lipson

Joseph Harry Lyons

Ronald Van Der Wilk

Kornelis Tijmen Hoekerd

Marc Hauptmann

Jorge Alberto Vieyra Salas

Erik Willem Bogaart

Sandra Van Der Graaf

Dylan John David Davies

Michael Alfred Josephus Kuijken

Antonius Hubertus Van Schijndel

Petrus Johannes Van Den Oever

Martinus Jozef Maria Kester

Sicco Oosterhoff

Naoko Tsugama

Edwin Johannes Maria Janssen

Maxime Biron

Sander Van Den Heijkant

Tamara Druzhinina

Ties Wouter Van Der Woord

Eric Willem Felix Casimiri

Zomer Silvester Houweling

Thijs Kater

Kevin Kornelsen

Guido Salmaso

Petrus Jacobus Maria Van Gils

Martinus Jozef Maria Kesters

Amoud Willem Notenboom

Inci Donmez Noyan

Lourdes Ferre Llin

Anne-Sophie Rollier

Richard Beaudry

Stephane Martel

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Membrane for EUV lithography

A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.

Pellicle membrane

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

A method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the pellicle membrane. Also provided is a pellicle substrate, the substrate including: a stack having a front face and back face, wherein one or more layers on the back face of the stack have been selectively removed to define a pellicle border region for holding the pellicle membrane before the layer which forms at least part of a pellicle membrane has been provided.

Method of manufacturing a membrane assembly

A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

Pellicle for EUV lithography

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Mask assembly and associated methods

A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.

A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.

Membrane assembly

Growing community of inventors

Eindhoven, Netherlands

Paul Janssen