Jds Uniphase Corporation

Optical Coating Laboratory, Inc.

Paul J Gasloli

Serge J Bierhuizen

Andrew Thomas Taylor

An optical thin film stack for a dark aperture is deposited using thermal ion-assisted deposition ('IAD'). The IAD provides an energetic deposition of chromium and chromium oxide that results in a dark mirror optical thin film stack with superior etch properties. Edge definition is improved, and the edge profile is controllable by the selection of IAD parameters. An in situ IAD cleaning process can be used to clean the substrate sufficiently so that an intermediate adhesion layer of chromium is not required.

Coating for forming a high definition aperture

An optical thin film stack provides reflection of essentially all light except for a selected amount of transmission over a selected wavelength range. Reflecting, rather than absorbing, unwanted light avoids heating caused by light absorption and allows productive use of the non-transmitted light in some applications. In some embodiments, reflector designs are 'stacked' on an optical substrate to provide serial optical reflectors. Stacking dichroic filters provides reduced sensitivity to cone angle and manufacturing advantages.

Growing community of inventors

Santa Rosa, CA, United States of America

Paul J Gasloli