Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Asml Netherlands B.v.

Paul Gräupner

Bernd Geh

Thomas Stammler

Dirk Stenkamp

Klaus Wurmbrand

Jochen Stühler

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Johannes Jacobus Matheus Baselmans

Wilhelm Ulrich

Toralf Gruner

Jozef Maria Finders

Jan Bernard Plechelmus Van Schoot

Helmut Beierl

Christoph Zaczek

Olaf Conradi

Adrianus Franciscus Petrus Engelen

Volker Graeschus

In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.

Lithographic apparatus and device manufacturing method

A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.

Projection exposure system and projection exposure method

In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements

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Aalen, Germany

Paul Gräupner