Asml Netherlands B.v.

Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Paul Graupner

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Johannes Jacobus Matheus Baselmans

Christiaan Alexander Hoogendam

Jan Haisma

Bernard Gellrich

Nicodemus Hattu

An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.

Lithographic apparatus and device manufacturing method

The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.

An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

Optical element for correction of aberration, and a lithographic apparatus comprising same

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Aalen, Germany

Paul Graupner