Leica Microsystems Lithography Gmbh

Vistec Lithography Limited

Paul George Harris

John Tingay

Martin Turnidge

An apparatus support () with a damping characteristic comprises a rigid reinforcing component, in particular a steel plate (), encapsulated by a body () of compliant material, particularly a composite of particulate mineral material and synthetic binder. The plate () defines an opening () at spacing from the upper side of the body () and a mounting ring () is embedded in the body so as to be disposed at least partly above the opening. The ring () has a peripheral flange () which is spaced from the plate () and from the upper side of the body and overlaps the plate in vertical projection. Material of the body is thus disposed above the flange () and also sandwiched between the flange and the plate so that a damping zone is present around the ring both above and below the flange.

Apparatus support

Substrate loading and unloading apparatus for automated loading and unloading of substrates (S) in a vacuum environment, for example the work region (A) of an electron beam lithography machine, comprises a substrate holder () with a substrate support table () and locating means (to) co-operable with the table to cause a supported substrate (S) to be pressed against and thereby located on the table (). A vacuum vessel () defines a loading and unloading chamber () with a transfer port () which is communicable with the evacuated region (A) of the machine and permits transfer of the holder () between the chamber () and the region (A) entirely within the vacuum environment. Release means (to) are present to withhold the co-operation of the table and locating means and to provide a temporary substrate support clear of the table so that substrates can be transferred to and from the table. The temporary support can be provided by support pins () which may additionally be rotatable for fine adjustment of the substrate angular position.

Substrate loading and unloading apparatus

A device for influencing an electron beam, in particular a beam deflector (), comprises a cylindrical support body () with an axial passage () through which the beam can propagate and axially spaced sets of coils () supported by the body and operable by electrical energy to produce electromagnetic fields for deflection of the beam. The device includes a cooling system for counteracting temperature rise in the body () due to operation of the coils (). The system comprises a pipe () of compliant material extending helically around and thermally conductively coupled, preferably adhesively bonded, to the support body () and serving to conduct liquid coolant for heat exchange with the body () over substantially all the external circumferential surface thereof. The cooling system further includes a pump () for conveying the coolant through the pipe () in a generally laminar flow so that, in conjunction with the flow path and pipe material, generation of vibrations is largely avoided and any vibrations that are generated are absorbed by the pipe () rather than transmitted to the body ().

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Haverhill, United Kingdom

Paul George Harris