Spts Technologies Limited

Eni Technology, Inc.

Mks Instruments, Inc.

Trikon Holdings Limited

Spp Process Technology Systems UK Limited

Aviza Technology Limted

Paul G Bennett

Daniel J Lincoln

Oliver James Ansell

David Andrew Tossell

John MacNeil

Anthony Barrass

A plasma generating arrangement includes a plurality of plasma sources, each plasma source including a respective antenna coil assembly electrically coupled to a common electrical terminal via a respective transmission line. Each transmission line is configured to communicate a radio frequency electrical power signal from the common electrical terminal to the respective antenna coil assembly, and has a length which is an odd multiple of &#xbc; of the wavelength of the radio frequency electrical power signal.

Plasma generating arrangement

A plasma apparatus includes a remote plasma source, a substrate processing chamber, and a connector which connects the remote plasma source to the substrate processing chamber. The remote plasma source includes a continuous peripheral wall structure that surrounds an inner channel, and that includes an electrode structure that defines at least a part of an internal channel extending internally within the continuous peripheral wall structure in which the inductively coupled plasma can be sustained. The remote plasma source also includes an electrical signal supply device for supplying an electrical signal that drives the electrode structure, and a plasma outlet which is in communication with the internal channel. The connector is in connection with the plasma outlet of the remote plasma source and the substrate processing chamber so that at least some components of the inductively coupled plasma sustained in the internal channel can be introduced to the substrate processing chamber.

Plasma apparatus

A plasma processing apparatus for plasma processing a substrate comprising includes a chamber having one or more walls, in which a portion of the walls of the chamber is an electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source, and an electrical signal supply device for supplying an electrical signal that drives the electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber.

Plasma processing apparatus

Apparatus for chemically etching a workpiece includes a chamber for receiving a process gas and having a pumping port for extracting exhaust gases, and a workpiece support located in the chamber upstream of the pumping port. The chamber further includes a sub-chamber located upstream of the pumping port and downstream of the workpiece support, and the sub-chamber includes a window and an excitation source, adjacent the window, for creating a plasma in a sample of the exhaust gases to create an optical emission which can be monitored through the window.

Apparatus for chemically etching a workpiece

This invention relates an ion beam source () for use with a non-electrical conducting target () including a grid () for extracting ions and a power supply for supplying pass power to the grid () to extract the ions.

Ion beam source

A power supply including an inverter receiving a DC input signal from a DC input source (). The inverter is implemented as a single-ended inverter. Each inverter is driven by a signal source (A,B), which outputs an AC signal. The output from each inverter is input to a first stage harmonic filter. The power supply includes an output circuit that includes a rectifier (D) arranged about a point so that if the inverter attempts to drive the point beyond a predetermined voltage, the rectifier conducts in order to return at least one of power and current to the DC input source. The output from the first harmonic filter (LA, C; LB, C) is output to a second harmonic filter (L, C) and is then output from the power supply.

Class E amplifier with inductive clamp

This invention relates to RV stand offs or breaks and in particular, but not exclusively not to stand offs which are suitable for use in plasma generating apparatus. A stand offincludes a resistive or insulating cylinder, through which gas feeds are drilled and a close coupled helically wound combination, generally indicated at. This combinationcomprises an RF conductive tubein the form of a braided cable; a thermocouplehaving twisted pair supply cablesand a heater elementin the form of a cable loop or pair.

RF stand offs

A power supply including an inverter receiving a DC input signal from a DC input source (). The inverter is implemented as a single-ended inverter. Each inverter is driven by a signal source (A,B), which outputs an AC signal. The output from each inverter is input to a first stage harmonic filter. The power supply includes an output circuit that includes a rectifier (D) arranged about a point so that if the inverter attempts to drive the point beyond a predetermined voltage, the rectifier conducts in order to return at least one of power and current to the DC input source. The output from the first harmonic filter (LA, CLB, C) is output to a second harmonic filter (LC) and is then output from the power supply.

A power supply including an inverter receiving a DC input signal from a DC input source (). The inverter is comprised of two half bridges (SA, SA and SB, SB). Each inverter is driven by a signal source (A,B), which outputs an AC signal. The output from each inverter is input to a first stage harmonic filter. The power supply includes an output circuit that includes first and second rectifiers (D, D) arranged about a point so that if the inverter attempts to drive the point beyond a predetermined first and second voltage, the respective rectifier conducts in order to return at least one of power and current to the DC input source. The output from the first harmonic filter (LA, C; LB, C) is output to a second harmonic filter (L, C) and is then output from the power supply.

A power supply including an inverter receiving a DC input signal from a DC input source ( ). The inverter is comprised of two half bridges (S A, S A and S B, S B). Each inverter is driven by a signal source ( A, B), which outputs an AC signal. The output from each inverter is input to a first stage harmonic filter. The power supply includes an output circuit that includes first and second rectifiers (D D ) arranged about a point so that if the inverter attempts to drive the point beyond a predetermined first and second voltage, the respective rectifier conducts in order to return at least one of power and current to the DC input source. The output from the first harmonic filter (L A, C L B, C ) is output to a second harmonic filter (L C ) and is then output from the power supply.

Power supplies having protection circuits

A half sine wave resonant drive circuit provides a greater duty cycle range of operation without a loss in power, particularly at higher frequencies. A resonant circuit is capacitivly coupled to a single switching device to provide the greater duty cycle range by recycling the gate charge of the switching device through the resonant circuit. A half sine wave drive signal is thereby produced from an input square wave signal. The driving amplitude is constant for operation over the range of duty cycles.

Half sine wave resonant drive circuit

An inductive coil assembly for plasma processing apparatus includes a coil and an external screen. The coil is constituted by a plurality of coil portions each including an inductive segment. The assembly also includes respective connectors for connecting each portion in parallel with the others and to an RF source. The connectors are configured such that the current flowing in any part of the coil other than the segments is balanced by current flowing in an opposite sense in an adjacent part.

Inductive coil assembly having multiple coil segments for plasma processing apparatus

A power supply including an inverter receiving a DC input signal from a DC input source ( ). The inverter is comprised of two half bridges (S A, S A and S B, S B). Each inverter is driven by a signal source ( A, B), which outputs an AC signal. The output from each inverter is input to a first stage harmonic filter. The power supply includes an output circuit that includes first and second rectifiers (D , D ) arranged about a point so that if the inverter attempts to drive the point beyond a predetermined first and second voltage, the respective rectifier conducts in order to return at least one of power and current to the DC input source. The output from the first harmonic filter (L A, C ; L B, C ) is output to a second harmonic filter (L , C ) and is then output from the power supply.

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Stoke Gifford, United Kingdom

Paul G Bennett